Results 21 to 30 of about 575,100 (391)

Recent Progress of Atomic Layer Technology in Spintronics: Mechanism, Materials and Prospects

Nanomaterials, 2022
The atomic layer technique is generating a lot of excitement and study due to its profound physics and enormous potential in device fabrication. This article reviews current developments in atomic layer technology for spintronics, including atomic layer ...
Yuanlu Tsai, Zhiteng Li, Shaojie Hu
doaj   +1 more source

Using a Heavy Inert Diffusion Additive for Superconformal Atomic Layer Deposition. [PDF]

J Phys Chem Lett
Choolakkal AH, Mpofu P, Niiranen P, Birch J, Pedersen H.   +4 more
europepmc   +3 more sources

Atomic layer deposition to heterostructures for application in gas sensors

International Journal of Extreme Manufacturing, 2023
Atomic layer deposition (ALD) is a versatile technique to deposit metals and metal oxide sensing materials at the atomic scale to achieve improved sensor functions.
Hongyin Pan, Lihao Zhou, Wei Zheng, Xianghong Liu, Jun Zhang, Nicole Pinna   +5 more
semanticscholar   +1 more source

Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching

Nanomaterials, 2022
The growing need for increasingly miniaturized devices has placed high importance and demands on nanofabrication technologies with high-quality, low temperatures, and low-cost techniques.
William Chiappim, Benedito Botan Neto, Michaela Shiotani, Júlia Karnopp, Luan Gonçalves, João Pedro Chaves, Argemiro da Silva Sobrinho, Joaquim Pratas Leitão, Mariana Fraga, Rodrigo Pessoa   +9 more
doaj   +1 more source

Atomic Layer Deposited Protective Layers [PDF]

Materials Science Forum, 2016
This paper reviews the use of Atomic Layer Deposition (ALD) in protective coatings. Because of the growth principle ALD allows the deposition of dense conformal films on substrates of different size and shape. Recently, ALD has received increasingly interest in deposition of protective coatings.
Salmi E., Leskelä M., Ritala M.
openaire   +2 more sources

Advances in Atomic Layer Deposition

Nanomanufacturing and Metrology, 2022
Atomic layer deposition (ALD) is a thin-film fabrication technique that has great potential in nanofabrication. Based on its self-limiting surface reactions, ALD has excellent conformality, sub-nanometer thickness control, and good process compatibility.
Jingming Zhang, Yicheng Li, K. Cao, Rong Chen   +3 more
semanticscholar   +1 more source

Atomic Layer Deposition of Nanolayered Carbon Films

C, 2021
In this paper, carbon thin films were grown using the plasma-enhanced atomic layer deposition (PE-ALD). Methane (CH4) was used as the carbon precursor to grow the carbon thin film.
Zhigang Xiao, Kim Kisslinger, Rebhadevi Monikandan   +2 more
doaj   +1 more source

Atomic-Scale Layer-by-Layer Deposition of FeSiAl@ZnO@Al2O3 Hybrid with Threshold Anti-Corrosion and Ultra-High Microwave Absorption Properties in Low-Frequency Bands

Nano-Micro Letters, 2021
A multiscale structure is realized through layer-by-layer deposition with atom-scale precision via atomic layer deposition FeSiAl@ZnO@Al 2 O 3 exhibits record-high absorption properties in low-frequency bands.
Wei Tian, Jinyao Li, Yifan Liu, Rashad Ali, Yang Guo, Longjiang Deng, N. Mahmood, Xian Jian   +7 more
semanticscholar   +1 more source

Multiferroic/Polymer Flexible Structures Obtained by Atomic Layer Deposition

Nanomaterials, 2022
The paper considers how a film of bismuth ferrite BiFeO3 (BFO) is formed on a polymeric flexible polyimide substrate at low temperature ALD (250 °C). Two samples of BFO/Polyimide with different thicknesses (42 nm, 77 nm) were studied.
Shikhgasan Ramazanov, Dinara Sobola, Gaji Gajiev, Farid Orudzhev, Pavel Kaspar, Adil Gummetov   +5 more
doaj   +1 more source

Plasma-Assisted Atomic Layer Deposition of IrO₂ for Neuroelectronics

Nanomaterials, 2023
In vitro and in vivo stimulation and recording of neuron action potential is currently achieved with microelectrode arrays, either in planar or 3D geometries, adopting different materials and strategies. IrO2 is a conductive oxide known for its excellent
Valerio Di Palma, Andrea Pianalto, Michele Perego, Graziella Tallarida, Davide Codegoni, Marco Fanciulli   +5 more
doaj   +1 more source