Results 21 to 30 of about 280,313 (347)

Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition [PDF]

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2011
Atomic layer deposition (ALD) is a technique capable of producing ultrathin conformal films with atomic level control over thickness. A major drawback of ALD is its low deposition rate, making ALD less attractive for applications that require high throughput processing.
Poodt, P.W.G., Cameron, D.C., Dickey, E., George, S.M., Kuznetsov, V., Parsons, G.N., Roozeboom, F., Sundaram, G., Vermeer, A.   +8 more
openaire   +3 more sources

In0.5Ga0.5N Layers by Atomic Layer Deposition [PDF]

Journal of Materials Chemistry C, 2021
We present an ALD approach to metastable In1‑xGaxN with 0.1 < x < 0.5 based on co-sublimed solid In- and Ga-precursors that were co-sublimed into the deposition chamber in one pulse. A near In0.5Ga0.5N film with a bandgap of 1.94 eV was achieved on Si (100) substrate. Epitaxial In1‑xGaxN (0002) was successfully grown directly on 4H-SiC (0001).
Polla Rouf, Justinas Palisaitis, Babak Bakhit, Nathan J. O'Brien, Henrik Pedersen   +4 more
openaire   +4 more sources

GaAs interfacial self-cleaning by atomic layer deposition [PDF]

, 2008
The reduction and removal of surface oxides from GaAs substrates by atomic layer deposition (ALD) of Al2O3 and HfO2 are studied using in situ monochromatic x-ray photoelectron spectroscopy.
A. M. Sonnet, B. Lee, C. L. Hinkle, E. M. Vogel, F. S. Aguirre-Tostado, G. J. Hughes, H. C. Kim, J. Kim, Jun G., K. J. Choi, M. Milojevic, R. M. Wallace, S. McDonnell   +12 more
core   +1 more source

Coating strategies for atomic layer deposition

Nanotechnology Reviews, 2017
Atomic layer deposition (ALD) is a vapor phase technique capable of producing a variety of materials. It consists of the alternation of separate self-limiting surface reactions, which enables accurate control of film thickness at the Angstrom level.
Hu Liang, Qi Weihong, Li Yejun
doaj   +1 more source

Positive exchange bias in ferromagnetic La0.67Sr0.33MnO3 / SrRuO3 bilayers [PDF]

, 2004
Epitaxial La0.67Sr0.33MnO3 (LSMO)/ SrRuO3 (SRO) ferromagnetic bilayers have been grown on (001) SrTiO3 (STO) substrates by pulsed laser deposition with atomic layer control. We observe a shift in the magnetic hysteresis loop of the LSMO layer in the same
C. B. Eom, Gan Q., L. J. Belenky, M. S. Rzchowski, X. Ke   +4 more
core   +1 more source

Highly Homogeneous Current Transport in Ultra-Thin Aluminum Nitride (AlN) Epitaxial Films on Gallium Nitride (GaN) Deposited by Plasma Enhanced Atomic Layer Deposition

Nanomaterials, 2021
This paper reports an investigation of the structural, chemical and electrical properties of ultra-thin (5 nm) aluminum nitride (AlN) films grown by plasma enhanced atomic layer deposition (PE-ALD) on gallium nitride (GaN).
Emanuela Schilirò, Filippo Giannazzo, Salvatore Di Franco, Giuseppe Greco, Patrick Fiorenza, Fabrizio Roccaforte, Paweł Prystawko, Piotr Kruszewski, Mike Leszczynski, Ildiko Cora, Béla Pécz, Zsolt Fogarassy, Raffaella Lo Nigro   +12 more
doaj   +1 more source

Atomic layer deposition for quantum dots based devices

Opto-Electronic Advances, 2020
Quantum dots (QDs) are promising candidates for the next-generation optical and electronic devices due to the outstanding photoluminance efficiency, tunable bandgap and facile solution synthesis.
Zhou Binze, Liu Mengjia, Wen Yanwei, Li Yun, Chen Rong   +4 more
doaj   +1 more source

Controlled Crystallinity of TiO2 Layers Grown by Atmospheric Pressure Spatial Atomic Layer Deposition and their Impact on Perovskite Solar Cell Efficiency

International Journal of Photoenergy, 2022
Atmospheric Pressure Spatial Atomic Layer Deposition (AP-SALD) is an upcoming deposition technique suitable for a variety of materials and combines the benefits of a regular atomic layer deposition with a significantly increased deposition rate at ...
Eugen Zimmermann, Ka Kan Wong, Tobias Seewald, Julian Kalb, Jonathan Linke, Giso Hahn, Lukas Schmidt-Mende   +6 more
doaj   +1 more source

Magnesium Sublimation for Growing Thin Films and Conformal Coatings on 1D Nanostructures

Nanomanufacturing, 2022
A method to conformally coat silica nanosprings with magnesium via sublimation at 450 °C has been developed. In addition, Mg thin films were grown on Si(100) using this method to determine the effects of substrate morphology (nanoscale curvatures vs ...
Aaron J. Austin, Nathan P. Dice, Elena Echeverria, Ashish Kumar Gupta, Jonathan Risner, Halle C. Helfrich, Ritesh Sachan, David N. McIlroy   +7 more
doaj   +1 more source

Material manufacturing from atomic layer

International Journal of Extreme Manufacturing, 2023
Atomic scale engineering of materials and interfaces has become increasingly important in material manufacturing. Atomic layer deposition (ALD) is a technology that can offer many unique properties to achieve atomic-scale material manufacturing ...
Xinwei Wang, Rong Chen, Shuhui Sun
doaj   +1 more source