Results 21 to 30 of about 280,118 (298)

Positive exchange bias in ferromagnetic La0.67Sr0.33MnO3 / SrRuO3 bilayers [PDF]

, 2004
Epitaxial La0.67Sr0.33MnO3 (LSMO)/ SrRuO3 (SRO) ferromagnetic bilayers have been grown on (001) SrTiO3 (STO) substrates by pulsed laser deposition with atomic layer control. We observe a shift in the magnetic hysteresis loop of the LSMO layer in the same
C. B. Eom, Gan Q., L. J. Belenky, M. S. Rzchowski, X. Ke   +4 more
core   +1 more source

Magnesium Sublimation for Growing Thin Films and Conformal Coatings on 1D Nanostructures

Nanomanufacturing, 2022
A method to conformally coat silica nanosprings with magnesium via sublimation at 450 °C has been developed. In addition, Mg thin films were grown on Si(100) using this method to determine the effects of substrate morphology (nanoscale curvatures vs ...
Aaron J. Austin, Nathan P. Dice, Elena Echeverria, Ashish Kumar Gupta, Jonathan Risner, Halle C. Helfrich, Ritesh Sachan, David N. McIlroy   +7 more
doaj   +1 more source

Highly Homogeneous Current Transport in Ultra-Thin Aluminum Nitride (AlN) Epitaxial Films on Gallium Nitride (GaN) Deposited by Plasma Enhanced Atomic Layer Deposition

Nanomaterials, 2021
This paper reports an investigation of the structural, chemical and electrical properties of ultra-thin (5 nm) aluminum nitride (AlN) films grown by plasma enhanced atomic layer deposition (PE-ALD) on gallium nitride (GaN).
Emanuela Schilirò, Filippo Giannazzo, Salvatore Di Franco, Giuseppe Greco, Patrick Fiorenza, Fabrizio Roccaforte, Paweł Prystawko, Piotr Kruszewski, Mike Leszczynski, Ildiko Cora, Béla Pécz, Zsolt Fogarassy, Raffaella Lo Nigro   +12 more
doaj   +1 more source

Material manufacturing from atomic layer

International Journal of Extreme Manufacturing, 2023
Atomic scale engineering of materials and interfaces has become increasingly important in material manufacturing. Atomic layer deposition (ALD) is a technology that can offer many unique properties to achieve atomic-scale material manufacturing ...
Xinwei Wang, Rong Chen, Shuhui Sun
doaj   +1 more source

Ultrathin Oxide Films by Atomic Layer Deposition on Graphene [PDF]

, 2012
In this paper, a method is presented to create and characterize mechanically robust, free standing, ultrathin, oxide films with controlled, nanometer-scale thickness using Atomic Layer Deposition (ALD) on graphene.
Andrew S. Cavanagh, Balandin A. A., Bunch J. S., Bunch J. S., Cavanagh A. S., Coleman J. N., Davidson B. D., Dean C. R., Dillon A. C., Elam J. W., Farmer D. B., Geim A. K., Groner M. D., Hencky H., Huang P. Y., J. Scott Bunch, Jen S.-H., Jonathan J. Travis, Koenig S. P., Lee C., Leskelä M., Leskelä M., Li X., Luda Wang, Miller D. C., Novoselov K. S., Novoselov K. S., Ott A. W., Ott A. W., Pinshane Y. Huang, Ritala M., Rogers J. A., Steven M. George, Steven P. Koenig, Suk J. W., Tapily K., Tripp M. K., Wang X., Williams J. R., Xinghui Liu, Yoneoka S., Zhan Y., Zhang Y. B.   +42 more
core   +1 more source

Light Yield Enhancement of 157-Gadolinium Oxysulfide Scintillator Screens for the High-Resolution Neutron Imaging

MethodsX, 2019
This paper reports on light yield enhancement of terbium-doped gadolinium oxysulfide based scintillator screens achieved by coating their substrates with thin layers of a high density and high atomic number material.
Jan Crha, Joan Vila-Comamala, Eberhard Lehmann, Christian David, Pavel Trtik   +4 more
doaj   +1 more source

Atomic layer deposition of functional multicomponent oxides

APL Materials, 2019
Advances in the fabrication of multicomponent oxide thin films are crucial to prepare specific compositions with precise structures and controlled interfaces.
Mariona Coll, Mari Napari
doaj   +1 more source

Influence of NiO ALD Coatings on the Field Emission Characteristic of CNT Arrays

Nanomaterials, 2022
The paper presents a study of a large-area field emitter based on a composite of vertically aligned carbon nanotubes covered with a continuous and conformal layer of nickel oxide by the atomic layer deposition method.
Maksim A. Chumak, Leonid A. Filatov, Ilya S. Ezhov, Anatoly G. Kolosko, Sergey V. Filippov, Eugeni O. Popov, Maxim Yu. Maximov   +6 more
doaj   +1 more source

Controlled Crystallinity of TiO2 Layers Grown by Atmospheric Pressure Spatial Atomic Layer Deposition and their Impact on Perovskite Solar Cell Efficiency

International Journal of Photoenergy, 2022
Atmospheric Pressure Spatial Atomic Layer Deposition (AP-SALD) is an upcoming deposition technique suitable for a variety of materials and combines the benefits of a regular atomic layer deposition with a significantly increased deposition rate at ...
Eugen Zimmermann, Ka Kan Wong, Tobias Seewald, Julian Kalb, Jonathan Linke, Giso Hahn, Lukas Schmidt-Mende   +6 more
doaj   +1 more source

Special Issue “ALD Technique for Functional Coatings of Nanostructured Materials”

Nanomaterials, 2022
Atomic layer deposition (ALD) is a vapor-phase technique that consists of the alternation of separated self-limiting surface reactions, which enable film thickness to be accurately controlled at the angstrom level, based on the former atomic layer ...
Javier Garcia Fernández, Victor Vega Martínez, Victor Manuel de la Prida Pidal   +2 more
doaj   +1 more source