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Spatial Atomic Layer Deposition
, 2019 In conventional atomic layer deposition (ALD), precursors are exposed sequentially to a substrate through short pulses while kept physically separated by intermediate purge steps. Spatial ALD (SALD) is a variation of ALD in which precursors are continuously supplied in different locations and kept apart by an inert gas region or zone.
Munoz-Rojas, David +4 more
openaire +4 more sources
Characterization of oxide barrier layers prepared by atomic layer deposition
Advances in Mechanical Engineering, 2017 Atomic layer deposition has become an important thin-film growth technique for producing gas diffusion barriers because of its low process temperature and its ability to produce uniform films.
Fa-Ta Tsai +3 more
doaj +1 more source
Molecules, 2023 Polysulfone (PSF) is one of the most used polymers for water treatment membranes, but its intrinsic hydrophobicity can be detrimental to the membranes’ performances.
Jeanne Casetta +4 more
doaj +1 more source
Bifunctional earth-abundant phosphate/phosphide catalysts prepared via atomic layer deposition for electrocatalytic water splitting [PDF]
, 2019 The development of active and stable earth-abundant catalysts for hydrogen and oxygen evolution is one of the requirements for successful production of solar fuels.
Dendooven, Jolien +7 more
core +2 more sources
Self-assembly and electron-beam-induced direct etching of suspended graphene nanostructures
, 2011 We report on suspended single-layer graphene deposition by a transfer-printing approach based on polydimethylsiloxane stamps. The transfer printing method allows the exfoliation of graphite flakes from a bulk graphite sample and their residue-free ...
Fabio Beltram +7 more
core +1 more source
Proceedings, 2019 Atomic layer deposition (ALD) is a chemical vapor deposition (CVD) deposition method inwhich high-quality [...]
Engin Ciftyurek +5 more
doaj +1 more source
On the kinetics of spatial atomic layer deposition [PDF]
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2012 Spatial atomic layer deposition (ALD) is a promising technology for high deposition rate and high-throughput ALD that can be used for roll-to-roll and large-area applications. In an ideal spatial ALD reactor, the design of the injector should be tuned to the deposition kinetics of the ALD reaction, requiring an in-depth knowledge of the dependencies of
Poodt, P.W.G. +5 more
openaire +4 more sources
Ti3SiC2-formation during Ti–C–Si multilayer deposition by magnetron sputtering at 650 °C [PDF]
, 2013 Titanium Silicon Carbide films were deposited from three separate magnetrons with elemental targets onto Si wafer substrates. The substrate was moved in a circular motion such that the substrate faces each magnetron in turn and only one atomic species ...
Alami +31 more
core +2 more sources
Evolutionary interplay between viruses and R‐loops
FEBS Letters, EarlyView.Viruses interact with specialized nucleic acid structures called R‐loops to influence host transcription, epigenetic states, latency, and immune evasion. This Perspective examines the roles of R‐loops in viral replication, integration, and silencing, and how viruses co‐opt or avoid these structures.
Zsolt Karányi +4 more
wiley +1 more source
Atomic Layer Deposition to Fine-Tune the Surface Properties and Diameters of Fabricated Nanopores [PDF]
, 2004 Atomic layer deposition of alumina enhanced the molecule sensing characteristics of fabricated nanopores by fine-tuning their surface properties, reducing 1/f noise, neutralizing surface charge to favor capture of DNA and other negative polyelectrolytes,
Branton, Daniel +5 more
core +1 more source