Results 51 to 60 of about 280,118 (298)

Recent Advances in Seeded and Seed-Layer-Free Atomic Layer Deposition of High-K Dielectrics on Graphene for Electronics

open access: yesC, 2019
Graphene (Gr) with its distinctive features is the most studied two-dimensional (2D) material for the new generation of high frequency and optoelectronic devices. In this context, the Atomic Layer Deposition (ALD) of ultra-thin high-k insulators on Gr is
Emanuela Schilirò   +3 more
doaj   +1 more source

Atomic layer deposition and superconducting properties of NbSi films

open access: yes, 2011
Atomic layer deposition was used to synthesize niobium silicide (NbSi) films with a 1:1 stoichiometry, using NbF5 and Si2H6 as precursors. The growth mechanism at 200oC was examined by in-situ quartz crystal microbalance (QCM) and quadrupole mass ...
Becker, Nicholas G.   +5 more
core   +1 more source

Atomic Layer Deposition to Fine-Tune the Surface Properties and Diameters of Fabricated Nanopores [PDF]

open access: yes, 2004
Atomic layer deposition of alumina enhanced the molecule sensing characteristics of fabricated nanopores by fine-tuning their surface properties, reducing 1/f noise, neutralizing surface charge to favor capture of DNA and other negative polyelectrolytes,
Branton, Daniel   +5 more
core   +1 more source

Advancing Research on Biomaterials and Biological Materials with Scanning Electron Microscopy under Environmental and Low Vacuum Conditions

open access: yesAdvanced Engineering Materials, EarlyView.
Herein, environmental scanning electron microscopy (ESEM) is discussed as a powerful extension of conventional SEM for life sciences. By combining high‐resolution imaging with variable pressure and humidity, ESEM allows the analysis of untreated biological materials, supports in situ monitoring of hydration‐driven changes, and advances the functional ...
Jendrian Riedel   +6 more
wiley   +1 more source

Seeding-Layer-Free Deposition of High-k Dielectric on CVD Graphene for Enhanced Gate Control Ability

open access: yesCrystals, 2022
The gate insulator is one of the most crucial factors determining the performance of a graphene field effect transistor (GFET). Good electrostatic control of the conduction channel by gate voltage requires thin gate oxides.
Yunpeng Yan   +4 more
doaj   +1 more source

Bifunctional earth-abundant phosphate/phosphide catalysts prepared via atomic layer deposition for electrocatalytic water splitting [PDF]

open access: yes, 2019
The development of active and stable earth-abundant catalysts for hydrogen and oxygen evolution is one of the requirements for successful production of solar fuels.
Dendooven, Jolien   +7 more
core   +2 more sources

Multimodal Mechanical Testing of Additively Manufactured Ti6Al4V Lattice Structures: Compression, Bending, and Fatigue

open access: yesAdvanced Engineering Materials, EarlyView.
In this experimental study, the mechanical properties of additively manufactured Ti‐6Al‐4V lattice structures of different geometries are characterized using compression, four point bending and fatigue testing. While TPMS designs show superior fatigue resistance, SplitP and Honeycomb lattice structures combine high stiffness and strength. The resulting
Klaus Burkart   +3 more
wiley   +1 more source

Transport properties of mid-infrared colloidal quantum dot films

open access: yes, 2012
The transport and thermal properties of HgTe colloidal quantum dot films with cut-off wavelengths in the mid-IR are investigated. The cut-off wavelength of this material can be tuned over the 3-5 \mu m range, which makes it a promising alternative to ...
Guyot-Sionnest, Philippe   +2 more
core   +1 more source

Laser Metal Deposition of Aluminum Alloys 7075 and 5083 with the Addition of Volatile Alloying Elements through Powder Blending

open access: yesAdvanced Engineering Materials, EarlyView.
This study investigates laser metal deposition of aluminum alloys EN AW‐7075 and EN AW‐5083, using powder blending to compensate zinc and magnesium evaporation. In situ alloying and ex situ alloying with ZnAl12 and AZ91 preserve near‐standard compositions and improve mechanical properties.
Finn Bendixen   +3 more
wiley   +1 more source

Atomic layer deposition for biosensing applications [PDF]

open access: yesBiosensors and Bioelectronics, 2018
Atomic layer deposition (ALD) is a thin film deposition technique currently used in various nanofabrication processes for microelectronic applications. The ability to coat high aspect ratio structures with a wide range of materials, the excellent conformality, and the exquisite thickness control have made ALD an essential tool for the fabrication of ...
Graniel, Octavio   +4 more
openaire   +5 more sources

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