Results 61 to 70 of about 280,118 (298)

The optical properties of transferred graphene and the dielectrics grown on it obtained by ellipsometry

open access: yes, 2018
Graphene layers grown by chemical vapour deposition (CVD) method and transferred from Cu-foils to the oxidized Si-substrates were investigated by spectroscopic ellipsometry (SE), Raman and X-Ray Photoelectron Spectroscopy (XPS) methods.
Alles, Harry   +6 more
core   +1 more source

Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes [PDF]

open access: yes, 2019
We demonstrate that applying atomic layer deposition-derived molybdenum disulfide (MoS2) catalytic coatings on copper gallium diselenide (CGSe) thin film absorbers can lead to efficient wide band gap photocathodes for photoelectrochemical hydrogen ...
Blum, M   +10 more
core   +3 more sources

Influence of Sample Preparation and Processing Procedures on the Thermal Diffusivity of MgO‐C Refractories

open access: yesAdvanced Engineering Materials, EarlyView.
The thermal diffusivity of MgO‐C refractories is highly sensitive to sample preparation and processing procedures. In this article, the effects of coking sequence, machining conditions, structural inhomogeneity, and graphite coating application on measurements using laser flash apparatus are systematically investigated.
Luyao Pan   +4 more
wiley   +1 more source

Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition

open access: yesJournal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2011
Atomic layer deposition (ALD) is a technique capable of producing ultrathin conformal films with atomic level control over thickness. A major drawback of ALD is its low deposition rate, making ALD less attractive for applications that require high throughput processing.
Poodt, P.W.G.   +8 more
openaire   +3 more sources

Atomic Layer Etching: What Can We Learn from Atomic Layer Deposition? [PDF]

open access: yesECS Journal of Solid State Science and Technology, 2015
Current trends in semiconductor device manufacturing impose extremely stringent requirements on nanoscale processing techniques, both in terms of accurately controlling material properties and in terms of precisely controlling nanometer dimensions. To take nanostructuring by dry etching to the next level, there is a fast growing interest in so-called ...
Faraz, T.   +3 more
openaire   +3 more sources

Enhanced Gamma Radiation Shielding Using Epoxy Quartz Fabric Composites Reinforced With CoCl2 Microparticles

open access: yesAdvanced Engineering Materials, EarlyView.
The growing demand for lightweight, nontoxic, and multifunctional gamma shielding materials has intensified efforts to find alternatives to conventional lead and aluminum‐based protectants. In this work, we develop epoxy quartz fabric composites reinforced with cobalt chloride (CoCl2) microparticles, fabricated via hand lay‐up with varying filler ...
Summan Urooge   +7 more
wiley   +1 more source

Heteroepitaxy of Group IV-VI Nitrides by Atomic Layer Deposition

open access: yes, 2013
Heteroepitaxial growth of selected group IV-VI nitrides on various orientations of sapphire (\alpha-Al2O3) is demonstrated using atomic layer deposition.
Becker, Nicholas G.   +7 more
core   +1 more source

Laser Metal Powder Deposition of Titanium Microalloyed HSLA Steel FeC0.12Si0.25Mn1.3

open access: yesAdvanced Engineering Materials, EarlyView.
This study investigates the additive manufacturing of titanium‐doped high‐strength low‐alloy (HSLA) steel via laser metal deposition. It reveals distinct process‐structure relationships for elemental powder blends compared to prealloyed feedstocks.
Olaf Stelling   +2 more
wiley   +1 more source

19.2% Efficient InP Heterojunction Solar Cell with Electron-Selective TiO2 Contact. [PDF]

open access: yes, 2014
We demonstrate an InP heterojunction solar cell employing an ultrathin layer (∼10 nm) of amorphous TiO2 deposited at 120 °C by atomic layer deposition as the transparent electron-selective contact.
Battaglia, Corsin   +8 more
core   +2 more sources

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