Results 71 to 80 of about 280,313 (347)

Transmission Electron Microscopy on Interface Engineered Superconducting Thin Films [PDF]

, 2003
Transmission electron microscopy is used to evaluate different deposition techniques, which optimize the microstructure and physical properties of superconducting thin films.
Bals, Sara, Blank, Dave H.A., Huijben, Mark, Leca, Victor, Rijnders, Guus, Tendeloo, Gustaav van   +5 more
core   +3 more sources

A Different Perspective on the Solid Lubrication Performance of Black Phosphorous: Friend or Foe?

Advanced Engineering Materials, EarlyView.
Researchers investigate black phosphorous (BP) as a standalone solid lubricant coating through ball‐on‐disc linear‐reciprocating sliding experiments in dry conditions. Testing on different metals shows BP doesn't universally reduce friction and wear. However, it achieves 33% friction reduction on rougher iron surfaces and 23% wear reduction on aluminum.
Matteo Vezzelli, Manel Rodríguez Ripoll, Sabine Schwarz, Ali Erdemir, Maria Clelia Righi, Carsten Gachot   +5 more
wiley   +1 more source

19.2% Efficient InP Heterojunction Solar Cell with Electron-Selective TiO2 Contact. [PDF]

, 2014
We demonstrate an InP heterojunction solar cell employing an ultrathin layer (∼10 nm) of amorphous TiO2 deposited at 120 °C by atomic layer deposition as the transparent electron-selective contact.
Battaglia, Corsin, Chen, Cheng-Ying, Chen, Kevin, Hettick, Mark, Javey, Ali, Kiriya, Daisuke, Lin, Yongjing, Yin, Xingtian, Zheng, Maxwell   +8 more
core   +2 more sources

Low‐Activation Compositionally Complex Alloys for Advanced Nuclear Applications—A Review

Advanced Engineering Materials, EarlyView.
Low‐activation compositionally complex alloys (LACCAs) are advanced metallic materials primarily composed of low‐activation elements, offering advantages such as rapid compliance with operational standards and safe recyclability. This review highlights their potential for extreme high‐temperature irradiation environments as structural materials for ...
Yangfan Wang, Hanliang Zhu, Zhiyang Wang, Zhijun Qiu, Xiao Wang, Zengxi Pan, Hongtao Zhu, Mingxing Zhang, Huijun Li   +8 more
wiley   +1 more source

Passivation of Edge States in Etched InAs Sidewalls

, 2017
We investigate different methods of passivating sidewalls of wet etched InAs heterostructures in order to suppress inherent edge conduction that is presumed to occur due to band bending at the surface leading to charge carrier accumulation.
Ensslin, Klaus, Ihn, Thomas, Karalic, Matija, Kovalenko, Maksym V., Mittag, Christopher, Müller, Susanne, Nazarenko, Olga, Tschirky, Thomas, Wegscheider, Werner   +8 more
core   +1 more source

Direct Consolidation of Copper–Graphene Composite by Rotary Swaging

Advanced Engineering Materials, EarlyView.
The applicability of the rotary swaging method for preparation of electroconductive copper–graphene composite by direct consolidation of powders is proven. The consolidated material features advantageous microstructure featuring fine grains and twins, with homogeneous distribution of graphene, primarily along the twin boundaries, which contribute to ...
Radim Kocich, Lenka Kunčická, Pavel Czernek   +2 more
wiley   +1 more source

Preventing unwanted atomic layer deposition by liquid sealing

Nano Trends
Atomic layer deposition (ALD) is an essential thin film fabrication technique widely used in electronic and energy systems, but avoiding ALD in untargeted areas has been a long-standing challenge that excludes the possibility of creating patterns through
Haochuan Wang, Zhibin Yi, Chun Li, Rui Xia, Yan Shao, Shaohu Zhan, Wenshuai Feng, Rui-Tao Wen, Xing Cheng, Guangfu Luo, Yanhao Yu   +10 more
doaj   +1 more source

Atomic Layer Deposition of Boron‐Doped Al2O3 Dielectric Films

Advanced Materials Interfaces, 2023
This paper presents preparation of boron‐doped Al2O3 thin films by atomic layer deposition (ALD) using phenylboronic acid (PBA) and trimethylaluminum (TMA) as precursors.
Xinzhi Li, Marko Vehkamäki, Mykhailo Chundak, Kenichiro Mizohata, Anton Vihervaara, Markku Leskelä, Matti Putkonen, Mikko Ritala   +7 more
doaj   +1 more source

Atomic Layer Deposition from Dissolved Precursors [PDF]

Nano Letters, 2015
We establish a novel thin film deposition technique by transferring the principles of atomic layer deposition (ALD) known with gaseous precursors toward precursors dissolved in a liquid. An established ALD reaction behaves similarly when performed from solutions. "Solution ALD" (sALD) can coat deep pores in a conformal manner.
Dirk Döhler, Elina Oks, Yanlin Wu, Lionel Santinacci, Maïssa K. S. Barr, Julien Bachmann, Julien Bachmann, Marc Wolf   +7 more
openaire   +4 more sources

Tribology of ZrC Coatings and Spherical Tips Acquired with Extraordinarily Stiff, Metal Atomic Force Microscopy Probes

Advanced Engineering Materials, EarlyView.
In this research, ZrC coatings are evaluated against various counterprobes at the microscale using novel super‐stiff atomic force microscopy cantilevers. The chemical composition of the coating is shown to be an important factor influencing coating hardness and Young's modulus, while surface roughness, counterprobe hardness, and surface energy are the ...
Piotr Jenczyk, Marcin Michałowski, Bogdan Warcholiński, Michał Milczarek, Adam Gilewicz   +4 more
wiley   +1 more source