Results 81 to 90 of about 355,263 (316)
Atomic layer deposition (ALD) has emerged as a promising method for surface modification of functional nanoparticles, enabling the versatile applications in energy, catalysis, and human health.
Guanghui Yan +6 more
doaj +1 more source
Atomic scale control of the thickness of thin film makes atomic layer deposition highly advantageous in the preparation of high quality super-lattices. However, precisely controlling the film chemical stoichiometry is very challenging.
Hongping Ma +8 more
semanticscholar +1 more source
The layer‐by‐layer (LbL) assembly of coordination solids, enabled by the surface‐mounted metal‐organic framework (SURMOF) platform, is on the cusp of generating the organic counterpart of the epitaxy of inorganics. The programmable and sequential SURMOF protocol, optimized by machine learning (ML), is suited for accessing high‐quality thin films of ...
Zhengtao Xu +2 more
wiley +1 more source
Scalable Production of Nanostructured Particles using Atomic Layer Deposition
Core-shell nanoparticles and other nanostructured particles have high potential in applications such as heterogeneous catalysis and energy conversion and storage.
Aristeidis Goulas, J. Ruud van Ommen
doaj +1 more source
High-Q Nanophotonic Resonators on Diamond Membranes using Templated Atomic Layer Deposition of TiO2 [PDF]
Amy Butcher +8 more
openalex +1 more source
Conformal Growth of Nanometer-Thick Transition Metal Dichalcogenide TiSx-NbSx Heterostructures over 3D Substrates by Atomic Layer Deposition: Implications for Device Fabrication [PDF]
Saravana Balaji Basuvalingam +4 more
openalex +1 more source
Quantum Emitters in Hexagonal Boron Nitride: Principles, Engineering and Applications
Quantum emitters in hexagonal boron nitride have emerged as a promising candidate for quantum information science. This review examines the fundamentals of these quantum emitters, including their level structures, defect engineering, and their possible chemical structures.
Thi Ngoc Anh Mai +8 more
wiley +1 more source
Atomic layer deposition of metals: Precursors and film growth
The coating of complex three-dimensional structures with ultrathin metal films is of great interest for current technical applications, particularly in microelectronics, as well as for basic research on, for example, photonics or spintronics.
D. Hagen, M. Pemble, M. Karppinen
semanticscholar +1 more source
Area-selective atomic layer deposition (ALD) of ZnO was achieved on SiO2 seed layer patterns on Hterminated silicon substrates, using diethylzinc (DEZ) as the zinc precursor and H2O as the coreactant.
A. Mameli +7 more
semanticscholar +1 more source
Synchrotron Radiation for Quantum Technology
Materials and interfaces underpin quantum technologies, with synchrotron and FEL methods key to understanding and optimizing them. Advances span superconducting and semiconducting qubits, 2D materials, and topological systems, where strain, defects, and interfaces govern performance.
Oliver Rader +10 more
wiley +1 more source

