Area-Selective Low-Pressure Thermal Atomic Layer Deposition of Gallium Nitride. [PDF]
ACS Omegavan der Wel BY +3 more
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Layer-dependent Raman polarization anisotropy in MoS₂ films grown by 200 mm-scale atomic layer deposition. [PDF]
Sci RepSmiri B +9 more
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Thermoelectric and electronic transport properties of thermal and plasma-enhanced ALD grown titanium nitride thin films. [PDF]
Nanoscale AdvGoel P, Kauppinen C, Raju R, Tittonen I.
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Influence of deposition conditions on ALD based Ru passivation for Cu-Cu hybrid bonding. [PDF]
Sci RepPark SW, Han H, Ahn CW, Park JK.
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ALD-Derived WO<sub>3-<i>x</i></sub> Leads to Nearly Wake-Up-Free Ferroelectric Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> at Elevated Temperatures. [PDF]
ACS Appl Electron MaterAfroze N +12 more
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Spatial Atomic Layer Deposition of IrO <sub><i>x</i></sub> Using (EtCp)Ir(CHD) and Atmospheric O<sub>2</sub>/N<sub>2</sub> Plasma. [PDF]
J Phys Chem C Nanomater Interfacesvan de Poll ML +5 more
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Atomic Layer Processes for UV-Stable Polymers: Synergistic Effects of Infiltration and Deposition of ZnO. [PDF]
ACS Appl Mater InterfacesMenasherov G +2 more
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Tip treatment for subnanoscale atomic force microscopy in liquid by atomic layer deposition Al2O3 coating. [PDF]
Microscopy (Oxf)Kojima R +5 more
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Engineering Metastability in Atomic Layer Deposition: Polymorph and Valence Control. [PDF]
SmallJeon J, Ryu SH, Ye S, Park GM, Kim SK.
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