Results 151 to 160 of about 29,849 (211)

Surface Functionalisation of Hyaluronic Acid-Based Foams with TiO₂ via ALD: Structural, Wettability and Antimicrobial Properties Analysis for Biomedical Applications. [PDF]

Materials (Basel)
Pabjańczyk-Wlazło E, Tarzyńska N, Bednarowicz A, Puszkarz AK, Szparaga G, Sztajnowski S, Kaczmarek P.   +6 more
europepmc   +1 more source

Design of Residual Stress-Balanced Transferable Encapsulation Platform Using Urethane-Based Polymer Superstrate for Reliable Wearable Electronics. [PDF]

Polymers (Basel)
Jo SH, Kim D, Park C, Jeong EG.
europepmc   +1 more source

Oxidation Dynamics and Surface Chemistry of Iridium and Iridium Oxide Films Grown by Atomic Layer Deposition Using O₂ and O₃. [PDF]

Small
Han JW, Jang JW, Harada R, Kim WH, Ahn JH, Park TJ.   +5 more
europepmc   +1 more source

Bridging classical and quantum interpretation of chemical state analysis by XPS/HAXPES to resolve short-range order in amorphous alumina films.

J Mater Chem A Mater
Gramatte S, Wang X, Hernández Bertrán MA, Cancellieri C, Pizzi G, Prezzi D, Timrov I, Politano O, Utke I, Jeurgens LPH, Turlo V.   +10 more
europepmc   +1 more source

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Mechanistic Details of Atomic Layer Deposition (ALD) Processes

Journal of the Korean Physical Society, 2007
Several examples are provided where the reaction mechanisms of atomic layer deposition (ALD) processes have been characterized by a combination of surface-sensitive techniques. In the first, a proposal is advanced for the layer-by-layer growth of metal films using metal carbonyl precursors and hydrogen as a carbon monoxide displacement agent.
Mingde Xu, Hugo Tiznado, Byung-Chang Kang, Menno Bouman, Ilkeun Lee, Francisco Zaera   +5 more
openaire   +1 more source

Frontiers in Applied Atomic Layer Deposition (ALD) Research

Materials Science Forum, 2012
Atomic layer deposition (ALD) has been a key player in advancing the science and technology of nanomaterials synthesis and device fabrication. The monolayer (ML) control of growth rate obtained with ALD combined with its ability to self-limit growth reactions at the gas-substrate interface can be exploited in fundamentally new ways to produce novel ...
Fei Wu, Jun Nan Wu, Sriya Banerjee, Oshri Blank, Parag Banerjee   +4 more
openaire   +1 more source

Atomic layer deposition (ALD) tungsten nano-electromechanical transistors

2010 IEEE 23rd International Conference on Micro Electro Mechanical Systems (MEMS), 2010
In this paper a relatively simple, CMOS compatible, top-down nano-fabrication process used in the fabrication of 3-terminal NEMS switches is introduced. The process is low-temperature, using atomic layer deposition tungsten (WALD) deposited at 120 °C as the structural material.
B.D. Davidson, S.M. George, V.M. Bright
openaire   +1 more source

Electrodeposition of Ru by atomic layer deposition (ALD)

Electrochimica Acta, 2008
Studies are presented describing attempts to form a cycle for the growth of Ru nanofilms using the electrochemical form of atomic layer deposition (ALD). Au substrates have been used to form Ru nanofilms, based on layer by layer growth of deposits, using surface limited reactions. These deposits were formed using surface limited redox replacement (SLRR)
Chandru Thambidurai, Youn-Geun Kim, John L. Stickney   +2 more
openaire   +1 more source

PtRu Nanofilm Formation by Electrochemical Atomic Layer Deposition (E-ALD)

Langmuir, 2014
The high CO tolerance of PtRu electrocatalysis, compared with pure Pt and other Pt-based alloys, makes it interesting as an anode material in proton exchange membrane fuel cells (PEMFC) and direct methanol fuel cells (DMFC). This report describes the formation of bimetallic PtRu nanofilms using the electrochemical form of atomic layer deposition (E-ALD)
Nagarajan, Jayaraju, Dhego, Banga, Chandru, Thambidurai, Xuehai, Liang, Youn-Guen, Kim, John L, Stickney   +5 more
openaire   +2 more sources