Results 71 to 80 of about 29,849 (211)

Optical properties of refractory metal based thin films [PDF]

, 2018
There is a growing interest in refractory metal thin films for a range of emerging nanophotonic applications including high temperature plasmonic structures and infrared superconducting single photon detectors. We present a detailed comparison of optical
Banerjee, Archan, Hadfield, Robert H., Heath, Robert M., Hemakumara, Dilini, Morozov, Dmitry, Nasti, Umberto, Thayne, Iain   +6 more
core   +3 more sources

Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method

AIP Advances, 2019
Titanium dioxide (TiO2) films were deposited by plasma enhanced atomic layer deposition (PE-ALD) system using tetrakis-dimethylamido-titanium (TDMAT) at 250 °C.
Heungseop Song, Donghyuk Shin, Ji-eun Jeong, Heungsoo Park, Dae-Hong Ko   +4 more
doaj   +1 more source

Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO

Crystals, 2020
Direct plasma enhanced-atomic layer deposition (PE-ALD) is adopted for the growth of ZnO on c-Si with native oxide at room temperature. The initial stages of growth both in terms of thickness evolution and crystallization onset are followed ex-situ by a ...
Alberto Perrotta, Julian Pilz, Roland Resel, Oliver Werzer, Anna Maria Coclite   +4 more
doaj   +1 more source

Atomic layer deposition of ZnS nanotubes

, 2009
We report on growth of high-aspect-ratio ($\gtrsim300$) zinc sulfide nanotubes with variable, precisely tunable, wall thicknesses and tube diameters into highly ordered pores of anodic alumina templates by atomic layer deposition (ALD) at temperatures as
K Nielsch, Landolt H, Law M, Lieber C, M Pelletier, R B Yang, Sh Farhangfar, Zhang H, Zhou T-Y, Zhu Y-C   +9 more
core   +1 more source

(Invited) Photo-Assisted ALD : Process Development and Application Perspectives [PDF]

, 2017
Atomic layer deposition (ALD) is a highly versatile thin-film deposition method that is presently utilized in many steps within microelectronic process flow and is gaining more and more interest in other fields of industry as well.
Han, Zhongmei, Kilpi, Väinö, Miikkulainen, Ville, Mizohata, Kenichiro, Ritala, Mikko, Räisänen, Jyrki, Vehkamäki, Marko, Väyrynen, Katja   +7 more
core   +1 more source

Comparative Study of Indium Oxide Films for High‐Mobility TFTs: ALD, PLD and Solution Process

Advanced Electronic Materials
Deposition of indium oxide base films for high‐mobility thin film transistors (TFTs) has been an important part in the implementation of high‐resolution and high‐frequency display back panels.
Min Guo, Jianting Wu, Hai Ou, Dongyu Xie, Qiaoji Zhu, Yi Huang, Mengye Wang, Lingyan Liang, Xiaoci Liang, Fengjuan Liu, Ce Ning, Xubing Lu, Hongtao Cao, Guangcai Yuan, Chuan Liu   +14 more
doaj   +1 more source

Using ALD To Bond CNTs to Substrates and Matrices [PDF]

Atomic-layer deposition (ALD) has been shown to be effective as a means of coating carbon nanotubes (CNTs) with layers of Al2O3 that form strong bonds between the CNTs and the substrates on which the CNTs are grown.
Bronikowski, Michael J., Kowalczyk, Robert S., Wong, Eric W.   +2 more
core   +1 more source

Plasma Processing of III-V Materials for Energy Efficient Electronics Applications [PDF]

, 2017
This paper reviews some recent activity at the James Watt Nanofabrication Centre in the University of Glasgow in the area of plasma processing for energy efficient compound semiconductor-based transistors.
Fu, Yen-Chun, Li, Xu, Millar, David, Peralagu, Uthayasankaran, Thayne, Iain   +4 more
core   +1 more source

Produção de filmes de ZnO por ALD (atomic layer deposition)

Revista dos Trabalhos de Iniciação Científica da UNICAMP, 2019
Filmes finos de ZnO tem várias aplicações em dispositivos eletrônicos como em diodos, transistores, dispositivos piezoelétricos e células solares. Neste trabalho desenvolvemos este material pela técnica ALD (Atomic Layer Deposition) utilizando um equipamento recém adquirido pelo laboratório de pesquisas fotovoltaicas do IFGW.
Francisco das Chagas Marques, Thiago Francisco Clementino de Oliveira   +1 more
openaire   +2 more sources

Atomic layer deposition of functional multicomponent oxides

APL Materials, 2019
Advances in the fabrication of multicomponent oxide thin films are crucial to prepare specific compositions with precise structures and controlled interfaces.
Mariona Coll, Mari Napari
doaj   +1 more source