Results 81 to 90 of about 29,849 (211)

Assessing the Environmental Impact of Atomic Layer Deposition (ALD) Processes and Pathways to Lower It. [PDF]

open access: yesACS Mater Au, 2023
Weber M   +7 more
europepmc   +1 more source

Light Yield Enhancement of 157-Gadolinium Oxysulfide Scintillator Screens for the High-Resolution Neutron Imaging

open access: yesMethodsX, 2019
This paper reports on light yield enhancement of terbium-doped gadolinium oxysulfide based scintillator screens achieved by coating their substrates with thin layers of a high density and high atomic number material.
Jan Crha   +4 more
doaj   +1 more source

Enhanced atomic layer etching of native aluminum oxide for ultraviolet optical applications

open access: yes, 2017
We report on the development and application of an atomic layer etching (ALE) procedure based on alternating exposures of trimethylaluminum and anhydrous hydrogen fluoride (HF) implemented to controllably etch aluminum oxide. Our ALE process utilizes the
Balasubramanian, Kunjithapatham   +5 more
core   +1 more source

Atomic Layer Deposition of Inorganic Thin Films on 3D Polymer Nanonetworks

open access: yesApplied Sciences, 2019
Atomic layer deposition (ALD) is a unique tool for conformally depositing inorganic thin films with precisely controlled thickness at nanoscale. Recently, ALD has been used in the manufacture of inorganic thin films using a three-dimensional (3D ...
Jinseong Ahn   +3 more
doaj   +1 more source

Carbon-Phenolic Ablators Modified by Ceramic Nanofilms Deposited via Atomic Layer Deposition (ALD) Technique

open access: yesCoatings
Ablative materials are widely employed to protect space vehicles from the extreme thermal conditions experienced during their flight into a planetary atmosphere. Carbon-phenolic ablators are composed of a phenolic matrix and a fibrous carbon reinforcement.
Rita Bottacchiari   +5 more
openaire   +1 more source

High-quality cobalt thin films by plasma-enhanced atomic layer deposition [PDF]

open access: yes
High-quality Co films with low resistivity (10 mu Omega cm) were deposited by plasma-enhanced atomic layer deposition (PE-ALD) from metallorganic precursors and NH3 plasma. The deposition characteristics and film properties were investigated. Especially,
Kim, H, Lee, HBR
core   +1 more source

Passivation of germanium surface using ALD [PDF]

open access: yes, 2014
Práce se zabývá pasivací povrchu germania pomocí chemického leptání a metodou depozice atomárních vrstev (ALD). Sledována byla především rychlost oxidace povrchu germania a zastoupení jednotlivých oxidů germania po použití vybraných metod pasivace ...
Kuba, Jakub
core  

Synthesis of a 3D network of Pt nanowires by atomic layer deposition on carbonaceous template

open access: yes, 2014
The formation of a 3D network composed of free standing and interconnected Pt nanowires is achieved by a two-step method, consisting of conformal deposition of Pt by atomic layer deposition (ALD) on a forest of carbon nanotubes and subsequent removal of ...
Bals, Sara   +8 more
core   +1 more source

Gas Transport Optimization for Atomic Layer Deposition Processes (ALD)

open access: yes, 2021
[ES] El proyecto se centra en la optimización del flujo en procesos ALD. Para ello se pretenden mejorar tanto el tiempo de un ciclo completo como la uniformidad de la capa depositada. El método de optimización se desarrollará haciendo uso de un benchmark validable y, posteriormente, será aplicado al reactor ALD. Mediante el software CFD Ansys Fluent se
openaire   +2 more sources

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