Results 61 to 70 of about 26,804,949 (344)

CHIANTI—An Atomic Database for Emission Lines. XV. Version 9, Improvements for the X-Ray Satellite Lines [PDF]

open access: yesAstrophysical Journal Supplement Series, 2019
CHIANTI contains a large quantity of atomic data for the analysis of astrophysical spectra. Programs are available in IDL and Python to perform calculation of the expected emergent spectrum from these sources.
K. Dere   +4 more
semanticscholar   +1 more source

Stark Broadening of N VI Spectral Lines

open access: yesUniverse, 2023
Stark broadening parameters, line widths and shifts, for 15 N VI multiplets are calculated using semiclassical perturbation theory for temperatures from 50,000 K to 2,000,000 K, and perturber density of 1016 cm−3. As perturbers have been taken electrons,
Milan S. Dimitrijević   +2 more
doaj   +1 more source

Structural insights and therapeutic targets in Acinetobacter baumannii capsule biosynthesis

open access: yesFEBS Letters, EarlyView.
Hypervirulent KL49 A. baumannii's capsular polysaccharide contains the nonulosonic acid 8‐epi‐Leg5,7Ac2, synthesized by epimerization via ElaA, ElaB, and ElaC. Crystal structures of ElaA, ElaB, and ElaC reveal their role in CMP‐Leg5,7Ac2 synthesis and regioselective C8 epimerization.
Woo Cheol Lee   +7 more
wiley   +1 more source

Investigating transcription factor dynamics in health and disease using FRAP

open access: yesFEBS Letters, EarlyView.
FRAP analysis of GFP‐tagged transcription factors reveals how molecular mobility and target engagement change in response to drug treatment. By combining live‐cell imaging, quantitative model fitting, and statistical analysis, this approach uncovers transcription factor dynamics linked to disease mechanisms, providing a powerful framework for ...
Kannan Govindaraj   +3 more
wiley   +1 more source

Understanding chemical and physical mechanisms in atomic layer deposition.

open access: yesJournal of Chemical Physics, 2020
Atomic layer deposition (ALD) is a powerful tool for achieving atomic level control in the deposition of thin films. However, several physical and chemical phenomena can occur which cause deviation from "ideal" film growth during ALD.
Nathaniel E. Richey   +2 more
semanticscholar   +1 more source

Foundations of atomic-level plasma processing in nanoelectronics

open access: yesPlasma Sources Science & Technology, 2022
This article discusses key elementary surface-reaction processes in state-of-the-art plasma etching and deposition relevant to nanoelectronic device fabrication and presents a concise guide to the forefront of research on plasma-enhanced atomic layer ...
K. Arts   +6 more
semanticscholar   +1 more source

Atomic Energy Commission Reports [PDF]

open access: yes, 1960
From introduction: "This is the second of a series of quarterly reports which will cover the progress and results from the conceptual design, economic evaluations and research and development work performed by the General Electric Company as part of the ...
U.S. Atomic Energy Commission
core   +2 more sources

Conserved binding mode but diverse interfaces of MreC‐PBP2 interactions

open access: yesFEBS Letters, EarlyView.
The crystal structure of abMreC reveals a conserved two β‐barrel architecture and provides structural insights into its role within the bacterial elongasome. The abMreC–abPBP2 complex model identifies the molecular basis of MreC‐mediated PBP2 recognition, contributing to the regulation of peptidoglycan synthesis.
Hyunseok Jang   +4 more
wiley   +1 more source

Contact dynamics from the atomic scale to nanostructured surfaces [PDF]

open access: yes, 2007
The collective mechanical behavior of a multitude of small contacts affects the friction between sliding bodies on the macroscopic scale. The contacts are complicated systems involving many atoms, which are constantly deformed, ruptured and reformed.
Maier, Sabine
core   +1 more source

Conformality in atomic layer deposition: Current status overview of analysis and modelling

open access: yesApplied Physics Reviews, 2019
Atomic layer deposition (ALD) relies on alternated, self-limiting reactions between gaseous reactants and an exposed solid surface to deposit highly conformal coatings with a thickness controlled at the submonolayer level.
Véronique Cremers   +2 more
semanticscholar   +1 more source

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