Results 1 to 10 of about 284,732 (318)
Gapping Fragile Topological Bands by Interactions [PDF]
10 pages, 6 figures. Added References, expanded Supplementary Information. See accompanying animation at https://youtu.be/78USiNqM8I0.
Turner, Ari M., Berg, Erez, Stern, Ady
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This work presents the temperature-dependent characteristics of the thin-barrier Al0.45Ga0.55N/GaN high electron mobility transistor (HEMT), p-type CuO gate HEMT, and high-k HfO2 metal–insulator–semiconductor HEMT (MIS-HEMT).
Yaopeng Zhao +7 more
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Recent developments in the synthesis of graphene-based structures focus on continuous improvement of porous nanostructures, doping of thin films, and mechanisms for the construction of three-dimensional architectures.
Jing Ning +6 more
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High temperature stability of H-diamond high frequency MOSFET with 300°C grown Al2O3 dielectric
The high frequency H-diamond metal-oxide-semiconductor field effect transistors (MOSFETs) were fabricated on single diamond substrate using 300°C ALD grown Al2O3 as gate dielectric and passivation layer.
Ma Yuanchen +8 more
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Transition metal dichalcogenides (TMDs) have attracted widespread attention due to their excellent electrochemical and catalytic properties. In this work, a tungsten (W)-modulated molybdenum selenide (MoSe2)/graphene heterostructure was investigated for ...
Qixian Liu +8 more
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The band gap in silicon nanocrystallites [PDF]
5 pages, latex, 2 figures. (Submitted Physical Review B)
Ranjan, V. +2 more
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Wide Band Gap Chalcogenide Semiconductors [PDF]
Wide band gap semiconductors are essential for today's electronic devices and energy applications due to their high optical transparency, as well as controllable carrier concentration and electrical conductivity. There are many categories of materials that can be defined as wide band gap semiconductors. The most intensively investigated are transparent
Rachel Woods-Robinson +6 more
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Ge N-Channel MOSFETs with ZrO2 Dielectric Achieving Improved Mobility
High-mobility Ge nMOSFETs with ZrO2 gate dielectric are demonstrated and compared against transistors with different interfacial properties of ozone (O3) treatment, O3 post-treatment and without O3 treatment.
Lulu Chou +7 more
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ZrO x Negative Capacitance Field-Effect Transistor with Sub-60 Subthreshold Swing Behavior
Here we report the ZrO x -based negative capacitance (NC) FETs with 45.06 mV/decade subthreshold swing (SS) under ± 1 V V GS range, which can achieve new opportunities in future voltage-scalable NCFET applications.
Siqing Zhang +5 more
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All‐in‐One Compression and Encryption Engine Based on Flexible Polyimide Memristor
It is anticipated that the rapid development of the Internet of Things (IoT) will improve the quality of human life. Nonetheless, large amounts of data need to be replicated, stored, processed, and shared, posing formidable challenges to communication ...
Rui Wang +11 more
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