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The Impact of Annealing on the Following Radiation Degradation Rate of Bipolar Devices
2017 IEEE Radiation Effects Data Workshop (REDW), 2017The effect of post irradiation annealing on the following radiation degradation rate of bipolar integrated circuit parameters was estimated. The degradation rate increases significantly during the irradiation in comparison with the irradiation before the annealing.
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Degradation of gain in bipolar transistors
IEEE Transactions on Electron Devices, 1994In this paper hot carrier related aging of n-p-n bipolar transistors is investigated experimentally and theoretically in order to bring physical insight into the bipolar h/sub FE/ (common emitter current gain) degradation. Electrical stress experiments are performed on transistors with different base doping profiles at varying temperatures.
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Degradation of hexagonal silicon-carbide-based bipolar devices
Journal of Applied Physics, 2006Only a few years ago, an account of degradation of silicon carbide high-voltage p-i-n diodes was presented at the European Conference on Silicon Carbide and Related Compounds (Kloster Banz, Germany, 2000). This report was followed by the intense effort of multiple groups utilizing varied approaches and subsequent progress in both fundamental ...
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Bipolar Degradation in 4H-SiC Thyristors
Materials Science Forum, 2012Bipolar degradation in 4H-SiC thyristors subjected to high current density stress is reported. The thyristor device structure, its fabrication process as well as testing conditions are described. The Electron Beam Induced Current (EBIC) technique was used for defect analysis in testing of both degraded and non-degraded devices.
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The temperature dependence of mixed mode degradation in bipolar transistors
Microelectronics Reliability, 2012Abstract The temperature dependence of mixed mode degradation is investigated. It is shown that a standard measure–stress–measure procedure can yield large errors in the extracted activation energy of this degradation mechanism. A new and efficient measurement procedure is presented that allows for an accurate extraction of the temperature dependence.
Guido T. Sasse, Martin Combrié
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