Enhanced Drive Current in 10 nm Channel Length Gate-All-Around Field-Effect Transistor Using Ultrathin Strained Si/SiGe Channel. [PDF]
Yugender P +5 more
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Development and Analysis of a Three-Fin Trigate Q-FinFET for a 3 nm Technology Node with a Strained-Silicon Channel System. [PDF]
Nanda S, Dhar RS, Awwad F, Hussein MI.
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Enhanced CPU Design for SDN Controller. [PDF]
Bazzi HS +4 more
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A Physics-Consistent Framework for Semiconductor Device Reliability Including Multiple Degradation Mechanisms. [PDF]
Bernstein JB, Avraham T, Wang B.
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An ultra energy-efficient hardware platform for neuromorphic computing enabled by 2D-TMD tunnel-FETs. [PDF]
Pal A +6 more
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A Review of Reliability in Gate-All-Around Nanosheet Devices. [PDF]
Wang M.
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Anisotropic exchange interaction of two hole-spin qubits. [PDF]
Geyer S +9 more
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Two-Dimensional Materials, the Ultimate Solution for Future Electronics and Very-Large-Scale Integrated Circuits. [PDF]
Qin L, Wang L.
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