The electrical characteristics of Nanosheet FET within the quasi-ballistic transport: Role of scattering and temperature variation. [PDF]
Shubham, Pandey RK.
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From Field Effect Transistors to Spin Qubits: Focus on Group IV Materials, Architectures and Fabrications. [PDF]
Petkov N, Fagas G.
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Post-Moore two-dimensional integrated electronics for angstrom-nodes. [PDF]
Shen Z +5 more
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Cross-architecture tuning of silicon and SiGe-based quantum devices using machine learning. [PDF]
Severin B +21 more
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High-voltage FinFET with floating poly and high-k material for enhanced intrinsic gain and safe operating area. [PDF]
Oh K +8 more
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Enhanced Drive Current in 10 nm Channel Length Gate-All-Around Field-Effect Transistor Using Ultrathin Strained Si/SiGe Channel. [PDF]
Yugender P +5 more
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Comprehensive Review of FinFET Technology: History, Structure, Challenges, Innovations, and Emerging Sensing Applications. [PDF]
Karimi K, Fardoost A, Javanmard M.
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Development and Performance Analysis of High-K Spacer-Induced Strained Si/SiGe Channel-Based Gate All Around FET for Thermal Effects. [PDF]
Yugender P +6 more
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Dual-directional CIM-based non-volatile SRAM for instant-on/off energy-constrained edge AI devices. [PDF]
Hemmasi SP +3 more
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Remarkably High Effective Mobility of 301 cm2/V·s in 3 nm Ultra-Thin-Body SnO2 Transistor by UV Annealing. [PDF]
Shih AC, Zhan YH, Chin A.
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