Results 101 to 110 of about 5,432,442 (291)

Nano- and microscratching as a potential method for texturing the Si surface

open access: yesMoldavian Journal of the Physical Sciences, 2014
The possibility of Si texturing through the use of nano- and microscratching with subsequent chemical etching has been investigated. The influence of the scratching speed, orientation of the indenter (face-on, edge-on) and normal load on the mechanism of
Prisăcaru, Andrian   +5 more
doaj  

Chitin‐Derived Carbon‐Metal Functional Materials

open access: yesAdvanced Functional Materials, EarlyView.
Functional carbon materials are synthesized from combination of biopolymer (chitin) and iron precursors. The resultant material exhibits superior surface area and adsorptive properties compared to carbon materials synthesized directly from pure chitin.
Herry Fang   +7 more
wiley   +1 more source

Bio‐Inspired Artificial Ionic Mechanoreceptor

open access: yesAdvanced Functional Materials, EarlyView.
A skin‐inspired artificial mechanoreceptor based on ionic interactions is presented for biomimetic tactile sensing. Pressure‐driven ionic redistribution within microfluidic channels generates a self‐powered electrical signal without external bias. The generated waveform exhibits mechanoreceptor‐like temporal features, including overshoot and undershoot,
Mohammad Akbari   +4 more
wiley   +1 more source

Compensation effect in the kinetics of chemical treatment of GaAs, InAs, GaSb, and InSb using bromine-releasing etching compositions based on H2O2–HBr solutions for the development of effective chemical polishing techniques

open access: yesФізика і хімія твердого тіла
In this work, the kinetic dependences of chemical-dynamic etching of semiconductor compounds GaAs, InAs, GaSb, and InSb in polishing etching mixtures based on H2O2–HBr without and with an organic solvent are investigated.
Iryna Sheliuk   +6 more
doaj   +1 more source

Dirac‐Source Linear X‐Ray Detection Diode

open access: yesAdvanced Functional Materials, EarlyView.
Monolayer graphene imparts near linear current‐voltage behavior to a perovskite X‐ray detection diode, contrasting with conventional diode‐like responses. Exploiting graphene's Dirac dispersion and a Schottky‐like back‐to‐back junction, the device achieves six‐orders‐of‐magnitude dark current suppression while retaining linearity over 200 V, enabling ...
Babar Shabbir   +8 more
wiley   +1 more source

Zirconium Surface Treatment via Chemical Etching. [PDF]

open access: yesMaterials (Basel), 2023
Gołasz P   +3 more
europepmc   +1 more source

CO2‐to‐CO Conversion in a Gas‐Fed, Zero‐Gap, PEM Electrolyzer Enabled by Polycations and Nitrogen‐Doped Carbon‐Supported Cobalt Nanoparticles

open access: yesAdvanced Functional Materials, EarlyView.
A gas‐fed, zero‐gap, PEM CO2 electrolyzer is realized by incorporating PDDA+ ions onto the carbonaceous Co/N‐C electrocatalyst, with gaseous H2 and CO2 fed into the anode and cathode, respectively. Operating without an aqueous electrolyte, the system sustains a peak FECO of 65.1% at 100 mA cm−2. ABSTRACT Electrochemical carbon dioxide reduction (ECO2R)
Yuen Leong Chow   +6 more
wiley   +1 more source

Application of ferrite-garnet epitaxial structures in ultra-high-frequency electronics

open access: yesТехнологія та конструювання в електронній апаратурі, 2005
Single-crystal iron-yttrium garnet (IYG) films with thicknesses ranging from a few micrometers to 92 μm were grown using the liquid-phase epitaxy method. Three methods of etching FeYG films were used to fabricate devices based on magnetostatic waves: ion
S. I. Yushchuk   +3 more
doaj  

Advances in Solution‐Processed Textile Triboelectric Nanogenerators: Ink Formation, Processing Strategies, Applications, and Challenges

open access: yesAdvanced Functional Materials, EarlyView.
Advanced ink systems for solution‐processed textile triboelectric nanogenerators are systematically summarized, spanning conductive, tribo‐negative, and tribo‐positive layers. By connecting ink chemistry, deposition methods, and device function, the present review reveals the key governing principles of solution development and highlights practical ...
Xinlong Sun, Stephen Beeby
wiley   +1 more source

The Influence of Etching Method on the Occurrence of Defect Levels in III-V and II-VI Materials

open access: yesNanomaterials
The influence of the etching method on the occurrence of defect levels in InAs/InAsSb type-II superlattice (T2SLs) and MCT photodiode is presented. For both analyzed detectors, the etching process was performed by two methods: wet chemical etching and ...
Kinga Majkowycz   +5 more
doaj   +1 more source

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