Results 91 to 100 of about 1,057 (152)

Study on the Electro-Fenton Chemomechanical Removal Behavior in Single-Crystal GaN Pin-Disk Friction Wear Experiments. [PDF]

Micromachines (Basel)
Ou Y, Shen Z, Xie J, Pan J.
europepmc   +1 more source

Tribo-Electrochemical Mechanism of Material Removal Examined for Chemical Mechanical Planarization of Stainless-Steel Using Citrate Buffer as a Complexing Agent. [PDF]

Materials (Basel)
Santefort DR, Gamagedara KU, Roy D.
europepmc   +1 more source

Demonstration of multiple-wavelength-band photonic integrated circuits using a silicon and silicon nitride 2.5D integration method. [PDF]

Nanophotonics
Fu M, Qiu H, Zhang H, Chen X, Qi J, Zhang Y, Xu Y, Liu S, Gu N, Yu H, Yi W, Li X, Guan X.   +12 more
europepmc   +1 more source

Research on Deflection and Stress Analyses and the Improvement of the Removal Uniformity of Silicon in a Single-Sided Polishing Machine Under Pressure. [PDF]

Micromachines (Basel)
Ye G, Yao Z.
europepmc   +1 more source

Enhanced Chemical Mechanical Polishing (Cmp) Performance of Porous Self-Assembled Spherical Cerium Oxide Via Re(La/Pr/Nd) Doping

Zhenyu Zhang, Ning Wang, Xingzi Wang, Zheng Zhao, Dong Chen, xianmin tan, Yuanyuan Zheng, Zongyu Feng, Xiangxi Zhong, Juanyu Yang, Xiaowei Huang   +10 more
openalex   +1 more source

Wafer-scale integration of photonic integrated circuits and atomic vapor cells. [PDF]

Nanophotonics
Grosman A, Zektzer R, Mazurski N, Stern L, Levy U.   +4 more
europepmc   +1 more source

Back Propagation Neural Network-Based Predictive Model for Magnetorheological-Chemical Polishing of Silicon Carbide. [PDF]

Micromachines (Basel)
Liang H, Chen W, Fu Y, Zhou W, Mo L, Jian Y, Wen Q, Liu D, He J.   +8 more
europepmc   +1 more source

Double-Sided Fabrication of Low-Leakage-Current Through-Silicon Vias (TSVs) with High-Step-Coverage Liner/Barrier Layers. [PDF]

Micromachines (Basel)
Yang B, Sun H, Zhu K, Wang X.
europepmc   +1 more source

The Stability Evaluation of Ceria Slurry Using Polymer Dispersants with Varying Contents for Chemical Mechanical Polishing Process. [PDF]

Polymers (Basel)
Hwang S, Park J, Kim W.
europepmc   +1 more source

Research on the Trajectory and Relative Speed of a Single-Sided Chemical Mechanical Polishing Machine. [PDF]

Micromachines (Basel)
Ye G, Yao Z.
europepmc   +1 more source