Results 71 to 80 of about 14,575 (156)

Advance on molecular dynamics simulations of precision polishing of SiC

Jin'gangshi yu moliao moju gongcheng
SignificanceSilicon carbide (SiC), as a representative material of third-generation semiconductors, holds vast potential for applications in microelectronics, optoelectronics, aerospace, and energy.
Jiayu ZHANG, Erchao MENG, Jianlin SUN, Jianzhong JI   +3 more
doaj   +3 more sources

Atomic-scale chemical mechanical polishing: advances and challenges for the post-Moore’s law era

Materials Futures
Chemical mechanical polishing (CMP) has emerged as a critical technology for local and global surface planarization in integrated circuit manufacturing for decades.
Lifei Zhang, Xinchun Lu
doaj   +1 more source

Composition design and optimization of electrochemical mechanical polishing slurry for single crystal SiC

Jin'gangshi yu moliao moju gongcheng
Objectives: Single crystal silicon carbide (SiC) is known for its high hardness and high chemical inertness, making it chanllenging to process effectively using traditional chemical mechanical polishing (CMP) methods.
Zhibin GU, Haoxiang WANG, Xin SONG, Renke KANG, Shang GAO   +4 more
doaj   +1 more source

Poster Sessions

HemaSphere, Volume 10, Issue S1, June 2026.
wiley   +1 more source

Effects of Hydrolysis Reaction and Abrasive Drag Force Accelerator on Enhancing Si-Wafer Polishing Rate and Improving Si-Wafer Surface Roughness

Nanomaterials
To satisfy the superior surface quality requirements in the fabrication of HBM (High-Bandwidth Memory) and 3D NAND Flash Memory, high-efficiency Si chemical mechanical planarization (CMP) is essential.
Min-Uk Jeon, Pil-Su Kim, Man-Hyup Han, Se-Hui Lee, Hye-Min Lee, Su-Bin Kim, Jin-Hyung Park, Kyoo-Chul Cho, Jinsub Park, Jea-Gun Park   +9 more
doaj   +1 more source

A Basic Study on Chemical Mechanical Polishing (CMP)

The Proceedings of The Manufacturing & Machine Tool Conference, 2002
Akiyoshi ODA, Masato OHTA, Junji SHIBATA, Takayasu KIMURA   +3 more
openaire   +2 more sources

The Polishing Effect of SiC Substrates in Femtosecond Laser Irradiation Assisted Chemical Mechanical Polishing (CMP)

, 2017
Chengwu Wang, S. Kurokawa, T. Doi, J. Yuan, Y. Sano, H. Aida, K. Zhang, Q. Deng   +7 more
semanticscholar   +1 more source

Treating chemical mechanical polishing (CMP) wastewater by electro-coagulation-flotation process with surfactant.

Journal of Hazardous Materials, 2005
C. Y. Hu, S. Lo, C. Li, W. Kuan
semanticscholar   +1 more source

A Study of Pad Conditioning in CMP(Chemical-Mechanical Polishing)

Proceedings of JSPE Semestrial Meeting, 2006
Kamikawa, Daichi, Fujita, Takasi, Doi, Tosiro, Kurihara, Akihiko   +3 more
openaire   +1 more source

Mechanical Property Control of Low-k Dielectrics for Diminishing Chemical Mechanical Polishing (CMP)-Related Defects in Cu-Damascene Interconnects

, 2004
K. Hijioka, F. Ito, M. Tagami, H. Ohtake, Y. Harada, T. Takeuchi, S. Saito, Y. Hayashi   +7 more
semanticscholar   +1 more source