Results 61 to 70 of about 1,061 (174)
A Novel Laboratorial Approach to Evaluate Bacterial Microleakage of Endodontic Sealers
Abstract To avoid failure of endodontic treatment, it is important to properly seal the root canals after chemomechanical preparation in order to avoid microleakage. Typically, sealing involves the use of gutta‐percha and sealing cement, the latter of which adheres to the dentin and fills the spaces between the gutta‐percha and the dentin walls ...
Emannuel Fonseca Thomé da Silva Monteiro +11 more
wiley +1 more source
Effect of slurry composition on the chemical mechanical polishing of thin diamond films
Nanocrystalline diamond (NCD) thin films grown by chemical vapour deposition have an intrinsic surface roughness, which hinders the development and performance of the films’ various applications. Traditional methods of diamond polishing are not effective
Jessica M. Werrell +7 more
doaj +1 more source
Nonlinear Strain‐Mediated Magnetoelectric Coupling in Sub‐Microscale Ni/BPZT Thin‐Film Devices
Sub‐micrometer Ni/BPZT thin‐film magnetoelectric devices with lateral gates enable localized, low‐voltage strain control of magnetization. By combining anisotropic magnetoresistance, nitrogen‐vacancy magnetometry, multiphysics strain simulations, and micromagnetic modelling, the study quantitatively links ferroelectric strain hysteresis to magnetic ...
Fanfan Meng +8 more
wiley +1 more source
Impact of Nickel Diffusion on Leakage Current Degradation in β‐Ga2O3 Schottky Barrier Diodes
The diffusion of Ni atoms during Schottky electrode fabrication induces localized stress defects in β‐Ga₂O₃ substrates, which act as primary reverse leakage pathways in SBDs. Elucidating this mechanism provides critical guidance for optimizing electrode composition in high‐performance β‐Ga₂O₃ electronics.
Ziyi Wang +9 more
wiley +1 more source
Chemical–mechanical planarization (CMP) is used to smoothen the topographies of a rough surface by combining several functions of tribology (friction, lubrication), chemistry, and electrochemistry (corrosion, wear, tribo-corrosion).
Kassapa Gamagedara, Dipankar Roy
doaj +1 more source
Scratch generation probability in chemical mechanical polishing (CMP) process
Chemical mechanical polishing (CMP) process is a critical new technology to planarize the wafer surface aided by the combined force of the chemical etching and mechanical polishing. In this process, defectivity due to scratch generation has become more and more important as it influences the wafer product quality, throughput and cost significantly with
openaire +4 more sources
This study investigates the UV‐induced degradation of silicon heterojunction cell precursors by isolating the impact of subcell layers under controlled UVA and UVB irradiation. Front hydrogenated amorphous silicon (i/n)a‐Si:H selective layers are identified as key degradation sites, leading to significant losses in minority carrier lifetime and iVoc ( >
Hugo Lajoie +7 more
wiley +1 more source
A self‐assembled conjugated hollow fiber monolith enables simultaneous solar‐driven desalination and hydrovoltaic electricity generation. Metal‐free polymerization produces cross‐linked hollow fibers that entangle into a porous monolith, followed by gradient polypyrrole coating for efficient light absorption and directional water transport.
Songah Jeong +5 more
wiley +1 more source
AI‐Driven Properties Prediction in Si3N4 Ceramics: Image‐Based and Processing Parameter Strategies
ABSTRACT This review presents AI‐based approaches for predicting key properties of silicon nitride (Si3N4) ceramics from both microstructural images and process parameters. Convolutional neural networks (CNNs) successfully predicted bending strength, fracture toughness, and dielectric breakdown strength directly from microstructural images, with higher
Ryoichi Furushima +3 more
wiley +1 more source
Materials used for fabricating sustainable composites. ABSTRACT A composite sample with 18% flax fiber flyash (FF) exhibits increased tensile strength (TS) and greater load‐transfer efficiency of the reinforcement under corrosive conditions.
Sumesh Keerthiveettil Ramakrishnan +2 more
wiley +1 more source

