Results 61 to 70 of about 7,532,110 (199)

Electrochemical Characterizations on Chemical Mechanical Polishing Compositions of Polishing Ruthenium Films in CMP Processes [PDF]

ECS Meeting Abstracts, 2012
Abstract not Available.
Tom X. Shi, James Henry, James Schlueter
openaire   +1 more source

Global Overview of the Use and Effectiveness of Ultraviolet C Technology in Fresh, Minimally Processed Apples and Apple Juice Over the Last 10 Years

Food Science &Nutrition, Volume 14, Issue 9, September 2026.
A decade of UV‐C irradiation in Apple postharvest processing: from whole fruit to juice. ABSTRACT The apple is a fruit with significant economic value and a rich nutritional profile, containing high levels of fiber, vitamins, minerals, and bioactive compounds. However, it is susceptible to chemical‐enzymatic oxidation and microbial spoilage.
Mahyra da Paixão e Silva, Caroline Rodrigues de Azevedo, Caroline Corrêa de Souza Coelho, Juliana Pereira Rodrigues Belas, Antonio Gomes Soares, Amauri Rosenthal, Otniel Freitas‐Silva   +6 more
wiley   +1 more source

A coupled material removal model for chemical mechanical polishing processes

, 2021
Chemical mechanical polishing (CMP) is a process used to obtain planarized surfaces in microelectronic device manufacturing. The planarization is achieved by material removal from the wafer surface by synergistic effect of chemical and mechanical actions.
Akbar, Wazir, Ertunç, Özgür
core   +1 more source

Quasi‐Standard Platform of AlScN Piezoelectric Integrated MEMS Technology (PIMT) For Multi‐Project Wafer Fabrication

Advanced Sensor Research, Volume 5, Issue 8, August 2026.
This report presents an 8‐inch quasi‐standard piezoelectric integrated MEMS technology (PIMT) platform which, through the integration of core and additional processes, reliably supports three rounds of multi‐project wafer (MPW) fabrication. Whilst ensuring support for mass production processes, the platform offers certain flexibility, providing a ...
Yongquan Su, Yuqiang Hu, Xingwang Zhu, Wenli Xue, Hao Huang, Yichen Liu, Jiachen Han, Anna Li, Cheng Zhang, Wanzhu Qiao, Jiaqi Huang, Peng Ding, Qianying Sun, Huan Liu, Tao Wu, Lihao Wang, Yang Wang, Hao Chen, Zhenyu Wu   +18 more
wiley   +1 more source

Effects of Nonionic Surfactants on Performance of Copper Chemical Mechanical Polishing

, 2013
During copper chemical mechanical polishing (Cu-CMP), the physical properties of slurry, such as the dispersion and suspension stability of abrasives, the interaction between particles and the polished surface, and the rheological characteristics ...
Wu, Y. F., Tsai, Tzu-hsuan; Wu, Y. F.
core   +1 more source

Review on modeling and application of chemical mechanical polishing

Nanotechnology Reviews, 2020
With the development of integrated circuit technology, especially after entering the sub-micron process, the reduction of critical dimensions and the realization of high-density devices, the flatness between integrated circuit material layers is becoming
Zhao Gaoyang, Wei Zhen, Wang Weilei, Feng Daohuan, Xu Aoxue, Liu Weili, Song Zhitang   +6 more
doaj   +1 more source

Two material removal modes in chemical mechanical polishing: mechanical plowing vs. chemical bonding

Friction, 2023
With the rapid development of semiconductors, the number of materials needed to be polished sharply increases. The material properties vary significantly, posing challenges to chemical mechanical polishing (CMP).
Yuan Wu, Liang Jiang, Wenhui Li, Jiaxin Zheng, Yushan Chen, Linmao Qian   +5 more
doaj   +1 more source

ARIA‐EAACI 2025: Person‐Centred, Digitally Enabled and Artificial Intelligence‐Assisted Change Management in Airway Diseases

Clinical and Translational Allergy, Volume 16, Issue 8, August 2026.
ABSTRACT Allergic Rhinitis and its Impact on Asthma (ARIA) was, up until 2017, a guideline using the best evidence (Grading of Recommendations, Assessment, Development and Evaluation, GRADE) and developed as a change management strategy. A second change management strategy—in collaboration with the European Academy of Allergy and Clinical Immunology ...
Jean Bousquet, Bernardo Sousa‐Pinto, Mohamed H. Shamji, Maria J. Torres, Ludger Klimek, Holger J. Schünemann, Mario Morais‐Almeida, Rafael José Vieira, Alkis Togias, Boleslaw Samolinski, Arunas Valiulis, Siân Williams, Oliver Pfaar, Torsten Zuberbier, Anna Bedbrook, Wienczyslawa Czarlewski, Maryam Ali Al‐Nesf, Rita Amaral, Josep M. Anto, Antonio Bognanni, Luisa Brussino, Alvaro A. Cruz, Violeta Kvedariene, Habib Douagui, Nikolaos G. Papadopoulos, G. Walter Canonica, Ivan Cherrez‐Ojeda, Mark Dykewicz, Bilun Gemicioglu, Mattia Giovannini, Brigita Gradauskiene, Tari Haahtela, Cristina Jacomelli, Tuomas Jartti, Miloš Jeseňák, Piotr Kuna, Désirée E. Larenas‐Linnemann, Amir H. A. Latiff, Bryan Martin, Yousser Mohammad, Kari Nadeau, Elizabete Nunes, Ken Ohta, Martial Ouédraogo, Padukudru A. Mahesh, Isabella Pali‐Schölll, Ana Margarida Pereira, Frederico S. Regateiro, Nicolas Roche, Mikhail Sofiev, Luis Taborda‐Barata, Charlotte Suppli Ulrik, Sanna K. Toppila‐Salmi, Marylin Valentin Rostan, Leticia de las Vecillas, Maria Teresa Ventura, Giovanni Viegi, De Yun Wang, He Zhang, Luo Zhang, Giorgio Ciprandi, Juan Carlos Ivancevich, Nikolai Khaltaev, Olga Lourenço, Lucas Leemann, Marine Savouré, Juan Jose Yepes‐Nuñez, Arzu Yorgancioglu, Baharudin Abdullah, Mona Al‐Ahmad, Julijana Asllani, Karl‐C. Bergmann, Jonathan A. Bernstein, Michael S. Blaiss, Fulvio Braido, Pedro Carreiro‐Martins, Lorenzo Cecchi, Antonio F. M. Giuliano, George Christoff, Ieva Cirule, Jaime Correia‐de‐Sousa, Elisio M. Costa, Biljana Cvetkovski, Stefano Del Giacco, Philippe Devillier, Dejan Dokic, Maia Gotua, Maria Antonieta Guzman, Elham Hossny, Tomohisa Iinuma, Carla Irani, Zhanat Ispayeva, Kaja Julge, Igor Kaidashev, Kazi S. Bennoor, Helga Kraxner, Inger Kull, Marek Kulus, Maciej Kupczyk, Andriy Kurchenko, Xin Luo, Stefania La Grutta, Lan Le Thi Tuyet, Michael Makris, Branislava Milenkovic, Neven Miculinic, Sang Min Lee, Stephen Montefort, André Moreira, Joaquim Mullol, Rachel Nadif, Alla Nakonechna, Hugo E. Neffen, Stefania Nicola, Marek Niedoszytko, Dieudonné Nyembue, Robyn E. O’Hehir, Ismail Ogulur, Yoshitaka Okamoto, Markus Ollert, Heidi Olze, Oscar Palomares, Petr Panzner, Hae‐Sim Park, Vincenzo Patella, Ruby Pawankar, Constantinos Pitsios, Todor A. Popov, Francesca Puggioni, Santiago Quirce, Agné Ramonaité, Marysia Recto, Maria Susana Repka‐Ramirez, Karla Robles‐Velasco, Menachem Rottem, Marianella Salapatas, Joaquin Sastre, Nicola Scichilone, Juan‐Carlos Sisul, Dirceu Solé, Manuel Soto‐Martinez, Milan Sova, Katarina Stevanovic, Pongsakorn Tantilipikorn, Ana Todo‐Bom, Vladyslav Tsaryk, Ioanna Tsiligianni, Marilyn Urrutia‐Pereira, Erkka Valovirta, Tuula Vasankari, Dana Wallace, Margitta Worm, Osman M. Yusuf, Fares Zaitoun, Mihaela Zidarn, on behalf of ARIA study group   +155 more
wiley   +1 more source

Effect of slurry composition on the chemical mechanical polishing of thin diamond films

Science and Technology of Advanced Materials, 2017
Nanocrystalline diamond (NCD) thin films grown by chemical vapour deposition have an intrinsic surface roughness, which hinders the development and performance of the films’ various applications. Traditional methods of diamond polishing are not effective
Jessica M. Werrell, Soumen Mandal, Evan L. H. Thomas, Emmanuel B. Brousseau, Ryan Lewis, Paola Borri, Philip R. Davies, Oliver A. Williams   +7 more
doaj   +1 more source

De novo or Salvage? Nucleotide Availability as a Driver of Bacterial Adaptation and Virulence

MicrobiologyOpen, Volume 15, Issue 4, August 2026.
Bacterial pathogens survive in different host environments by switching between making nucleotides by de novo synthesis and scavenging them from the host. This flexibility supports growth and virulence making nucleotide metabolism an attractive therapeutic target.
Riya Joshi, Alastair G. McEwan, Ulrike Kappler   +2 more
wiley   +1 more source