Polymer Nanoparticles Applied in the CMP (Chemical Mechanical Polishing) Process of Chip Wafers for Defect Improvement and Polishing Removal Rate Response [PDF]
, 2023 Wei-Lan Chiu, Ching‐I Huang
openalex +1 more source
Effect of Abrasive Particles on Frictional Force and Abrasion in Chemical Mechanical Polishing(CMP) [PDF]
, 2004 Goo-Youn Kim
openalex +1 more source
Front Cover: Strategies for Enhancing SiO 2 Chemical‐Mechanical Polishing (CMP): Functional Nanoparticle Abrasive Design and Integration [PDF]
Hyeonseok Lee +7 more
openalex +1 more source
Molecular dynamics simulations addressing atomic-scale core issues in chemical mechanical polishing and post-CMP cleaning: A concise review [PDF]
Lifei Zhang, Ming Ji, Xinchun Lu
openalex +1 more source
Characteristics of 2-Step CMP (Chemical Mechanical Polishing) Process using Reused Slurry by Adding of Silica Abrasives [PDF]
, 2003 ;;;;;;
openalex +1 more source
Improvement of Chemical Mechanical Polishing (CMP) Performance of Nickel by Additions of Abrasive and Various Oxidizers [PDF]
, 2005 Gwon-Woo Choi
openalex +1 more source
Novel Chemical Mechanical Polishing/Plasma-Chemical Vaporization Machining (CMP/P-CVM) Combined Processing of Hard-to-Process Crystals Based on Innovative Concepts [PDF]
, 2014 Toshiro Doi +27 more
openalex +1 more source
Research on the Application of Diamond Film in Chemical Mechanical Polishing. [PDF]
Nanomaterials (Basel)Wang Y +10 more
europepmc +1 more source
Simulation Analysis of the Chemical Mechanical Polishing Process for Monocrystal 4H-Silicon Carbide Based on Molecular Dynamics. [PDF]
Micromachines (Basel)Lei Y, Guo W, Feng K, Sun Z.
europepmc +1 more source