Results 51 to 60 of about 1,057 (152)

A High-Efficiency Environmentally Friendly Polishing Slurry for K9 Glass Utilizing Cerium-Based Compounds. [PDF]

Molecules
Li S, Ye R, Zou Z, He Z, Feng K, Cui H, Chi R, Chen Y, Luo Y.   +8 more
europepmc   +1 more source

Nanoparticles removal in post-CMP (Chemical-Mechanical Polishing) cleaning

, 2006
Dedy Ng
openalex   +1 more source

Wettability-Controlled Hydrophobic Coating of CMP Component Using PTFE and DLC for Mitigating Slurry Agglomeration and Contamination. [PDF]

Micromachines (Basel)
Lee E, Sun K, So Y, Baek J, Shin JH, Kim HD, Youn YB, Kim MW.   +7 more
europepmc   +1 more source

Process Temperature Control for Low Dishing in CMP. [PDF]

Materials (Basel)
Shin Y, Jeong J, Shin J, Jeong H.
europepmc   +1 more source

2207 Effects of Ultrasonic Vibration on Abrasive Pellet Working Life for Si Wafer using Ultrasonic Assisted Fixed Abrasive Chemical Mechanical Polishing(UF-CMP)

, 2015
Mitsuyoshi Nomura, YUTAKA MATSUSHIMA, Yongbo Wu, Masakazu Fujimoto, Zhou Libo   +4 more
openalex   +1 more source

Direct Measurement of Planarization Length for Copper Chemical Mechanical Planarization Polishing (CMP) Processes Using a Large Pattern Test Mask [PDF]

, 2001
Paul G. LeFevre, Albert Gonzales, Tom J. Brown, Gerald Martin, Tamba Tugbawa, Tae Park, Duane S. Boning, Michael Gostein, John Nguyen   +8 more
openalex   +1 more source

Effect of Parameters of Chemical Mechanical Polishing (CMP) for Improving Surface Roughness for Semiconductor Material Kind Silicon

, 2023
Shakir M. Mousa, Shukry H. Aghdeab
openalex   +2 more sources

A Comprehensive Review of the Nano-Abrasives Key Parameters Influencing the Performance in Chemical Mechanical Polishing. [PDF]

Nanomaterials (Basel)
Bellahsene H, Sene S, Félix G, Larionova J, Ferrari M, Guari Y.   +5 more
europepmc   +1 more source

Characterization of Ceria Nanoparticles as Abrasives Applied with Defoaming Polymers for CMP (Chemical Mechanical Polishing) Applications [PDF]

Sohee Hwang, Woonjung Kim
openalex   +1 more source

Prediction Model and Experimental Verification of Surface Roughness of Single Crystal Diamond Chemical Mechanical Polishing Based on Archimedes Optimization Algorithm. [PDF]

Micromachines (Basel)
Li Z, Guo X, Fan G, Deng Y, Kang R, Wang X.   +5 more
europepmc   +1 more source