Effects of Hydrolysis Reaction and Abrasive Drag Force Accelerator on Enhancing Si-Wafer Polishing Rate and Improving Si-Wafer Surface Roughness. [PDF]
Jeon MU +9 more
europepmc +1 more source
Rice Husk Fiber-Based Polishing Pad for Chemical Mechanical Polishing (CMP) of Sapphire
Sethavut Duangchan +5 more
openalex +1 more source
Chemical Mechanical Polishing (CMP) of Doped and Undoped Ceramic and Polymeric Dielectric Materials for Microelectronic Applications [PDF]
Parshuram B. Zantye +2 more
openalex +1 more source
Controllable Synthesis of Monodisperse CeO<sub>2</sub> Nanoparticles with Tunable Sizes for Chemical-Mechanical Polishing. [PDF]
Ma Y +6 more
europepmc +1 more source
Agent based diagnostic system for the defect analysis during chemical mechanical polishing (CMP)
Akhauri Prakash Kumar
openalex +2 more sources
Controlled Synthesis and Formation Mechanism of Uniformly Sized Spherical CeO<sub>2</sub> Nanoparticles. [PDF]
Xie J +6 more
europepmc +1 more source
Study on polishing mechanisms of BEOL metal interconnects based on chemical and mechanical synergy. [PDF]
Tian Z +5 more
europepmc +1 more source
Chemical mechanical polishing as an alternative surface treatment technique for corrosion prevention of carbon steel in an acidic medium. [PDF]
Ahmed M +6 more
europepmc +1 more source

