Chemical Mechanical Polishing of Zerodur<sup>®</sup> Using Silica and Ceria Nanoparticles: Toward Ultra-Smooth Optical Surfaces. [PDF]
Nanomaterials (Basel)Bellahsene H +10 more
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Methods for Enhancing the Formation of Hydroxyl Radicals When Polishing Single Crystal SiC. [PDF]
Materials (Basel)Shi D, Feng K, Zhao T.
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Monodisperse SiO<sub>2</sub> Spheres: Efficient Synthesis and Applications in Chemical Mechanical Polishing. [PDF]
Nanomaterials (Basel)Ge J +7 more
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Investigation of the Visible Photocatalytic-Fenton Reactive Composite Polishing Process for Single-Crystal SiC Wafers Based on Response Surface Methodology. [PDF]
Micromachines (Basel)Han Z, Ran B, Pan J, Zhuang R.
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Synergistic Multi-Mechanism Enhancement in Chemomechanical Abrasive Polishing of Polycrystalline Diamond via a New SiO<sub>2</sub>-Diamond Slurry in High-Concentration H<sub>2</sub>O<sub>2</sub> Solution. [PDF]
Materials (Basel)Zheng X +8 more
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The Chemical Deformation of a Thermally Cured Polyimide Film Surface into Neutral 1,2,4,5-Benzentetracarbonyliron and 4,4'-Oxydianiline to Remarkably Enhance the Chemical-Mechanical Planarization Polishing Rate. [PDF]
Nanomaterials (Basel)Han MH +10 more
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Effect of Structurally Modified Toluene Diisocyanate-Based Polyurethane Pads on Chemical Mechanical Polishing of 4H Silicon Carbide Substrate. [PDF]
Polymers (Basel)Meng Y, Zhang S, Zhang Z.
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