Results 281 to 290 of about 1,091,701 (330)

Micromachined thermocouple microwave detector by commercial CMOS fabrication

IEEE Transactions on Microwave Theory and Techniques, 1998
This paper reports on the design and testing of a thermocouple microwave detector fabricated through a commercial CMOS foundry with an additional maskless etching procedure. The detector measures true r.m.s. power of signals in the frequency range from 50 MHz to 20 GHz, and input power range from -30 to +10 dBm, the device has linearity better than ...
V. Milanovic, M. Gaitan, M.E. Zaghloul
openaire   +1 more source

CMOS-MEMS technologies for the applications of environment sensors and environment sensing hubs

Journal of Micromechanics and Microengineering, 2021
The booming growth in environmental conditions sensing and monitoring pushes the need of inexpensive environment sensors with small size and low power consumption.
Ya-Chu Lee, Meng-Lin Hsieh, Pen-Sheng Lin, Chia-Hung Yang, Sheng-Kai Yeh, Thi Thu Do, W. Fang   +6 more
semanticscholar   +1 more source

Micromachined microwave transmission lines by commercial CMOS fabrication

Proceedings of the 39th Midwest Symposium on Circuits and Systems, 2002
Coplanar waveguides were designed and fabricated in standard CMOS with post-processing micromachining. Transmission line layouts were designed with commercial CAD tools, ICs were fabricated through a commercial CMOS foundry, and subsequently suspended by maskless top-side etching.
V. Milanovic, M. Gaitan, E.D. Bowen, M.E. Zaghloul   +3 more
openaire   +1 more source

A Systems Approach to Computing in Beyond CMOS Fabrics

Proceedings of the 54th Annual Design Automation Conference 2017, 2017
Emerging applications require computing platforms to extract task-relevant information from increasingly large amounts of data. These requirements place stringent constraints on energy efficiency, throughput, latency, and for certain data types, security and privacy of computing platforms.
Ameya Patil, Naresh Shanbhag, Lav Varshney, Eric Pop, H.-S. Philip Wong, Subhasish Mitra, Jan Rabaey, Jeffrey Weldon, Larry Pileggi, Sasikanth Manipatruni, Dmitri Nikonov, Ian Young   +11 more
openaire   +1 more source

Thermoelectric power sensor for microwave applications by commercial CMOS fabrication

IEEE Electron Device Letters, 1997
This work describes an implementation of a thermoelectric microwave power sensor fabricated through commercial CMOS process with additional maskless etching. The sensor combines micromachined coplanar waveguide and contact pads, a microwave termination which dissipates heat proportionally to input microwave power, and many aluminum-polysilicon ...
V. Milanovic, M. Gaitan, E.D. Bowen, N.H. Tea, M.E. Zaghloul   +4 more
openaire   +1 more source

Nanotechnology in Silicon CMOS Fabrication

ECS Meeting Abstracts, 2008
Abstract not Available.
openaire   +1 more source

NWELL CMOS fabrication process for the Virginia Microelectronics Center

Proceedings of the Fourteenth Biennial University/Government/Industry Microelectronics Symposium (Cat. No.01CH37197), 2002
The VMC is developing a CMOS process to help teach microelectronics students the techniques of semiconductor fabrication. It is also intended to be a vehicle for the implementation of VLSI digital and analog circuit designs at VCU. The development of the CMOS process is an on-going senior electrical engineering project.
N.R. Balderson, G. Cordova, null Kwang Yi, A. Guliani, S. Manek, G.W. Schiavone, J. Harrison, R.E. Pearson   +7 more
openaire   +1 more source

A novel capacitive-type humidity sensor using CMOS fabrication technology

Sensors and Actuators B: Chemical, 2004
Abstract This paper reports a novel capacitive humidity sensor integrated on a polysilicon heater. The sensor was fabricated with the industrial standard CMOS process to achieve a cost-effective solution for accurate and reliability. The sensing material polyimide was obtained by a post-processing step after the standard CMOS fabrication. The sensing
Lei Gu, Qing-An Huang, Ming Qin
openaire   +1 more source

Submicrometer poly-Si CMOS fabrication with low-temperature laser doping

IEEE Electron Device Letters, 1989
The laser doping process for submicrometer CMOS devices with leakage currents as low as 10/sup -12/ A/ mu m for both n-channel and p-channel devices is discussed. The I-V characteristics are comparable to those of poly-Si devices fabricated using ion implantation and high-temperature annealing processes.
H. Tomita, M. Negishi, T. Sameshima, S. Usui   +3 more
openaire   +1 more source

Subnanometer Linewidth Uniformity in Silicon Nanophotonic Waveguide Devices Using CMOS Fabrication Technology

IEEE Journal of Selected Topics in Quantum Electronics, 2010
We report subnanometer linewidth uniformity in silicon nanophotonics devices fabricated using high-volume CMOS fabrication tools. We use wavelength-selective devices such as ring resonators, Mach-Zehnder interferometers, and arrayed waveguide gratings to assess the device nonuniformity within and between chips.
Selvaraja S.K., Bogaerts W., Dumon P., Van Thourhout D., Baets R.   +4 more
openaire   +1 more source