Results 291 to 300 of about 567,761 (300)

Three-Dimensional CMOS IC's Fabricated by Using Beam Recrystallization

IEEE Electron Device Letters, 1983
exaly  

CMOS fabrication process utilizing special transistor orientation

2003
ARMSTRONG MARK, SCHROM GERHARD, KUHN KELIN J, PACKAN PAUL A, TYAGI SUNIT D, THOMPSON SCOTT E   +5 more
openaire   +3 more sources

CMOS fabrication

2010
openaire   +4 more sources

Characterization of APDs Fabricated by 0.18 μm CMOS Process in Blue Wavelength Region

2012
Koichi Iiyama, Kazuaki Maekita, Toshiyuki Shimotori   +2 more
exaly  

Diffusion topography engineering for high performance CMOS fabrication

2008
KO CHIH-HSIN, LEE WEN-CHIN, KE CHUNG-HU, CHEN HUNG-WEI   +3 more
openaire   +1 more source

A CMOS Integrated Three-Axis Accelerometer Fabricated With Commercial Submicrometer CMOS Technology and Bulk-Micromachining

IEEE Transactions on Electron Devices, 2001
exaly  

Investigation of Deuterium De-Passivation by Repetitive Thermal Stress in CMOS Fabrication

IEEE Transactions on Device and Materials Reliability
Ju-Won Yeon, Sung-Su Yoon, Hyo-Jun Park, Tae-Hyun Kil, Dong-Hyun Wang, Khwang-Sun Lee, Dae-Han Jung, Ja-Yun Ku, Jun-Young Park   +8 more
openaire   +1 more source

CMOS fabrication methods for back-gate transistor

LU CHUN-CHIEH, CHAO TZU ANG, CHENG CHAO-CHING, LI LAIN-JONG   +3 more
openaire   +1 more source

3-Dimensional SOI/CMOS IC's Fabricated by Beam Recrystallization

1983
exaly  

Method for reducing poly-depletion in dual gate CMOS fabrication process

2010
LEE CHANG YEOL, CHOI DEUK SUNG
openaire   +1 more source