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Full-duplex wireless deep ultraviolet light communication
Optics Letters, 2022With recent advancements in deep ultraviolet (DUV) light-emitting diodes (LEDs) and solar-blind photodetectors, wireless DUV light communication is emerging as a novel technique, which can extend transmission ranges and avoid solar interference. Herein, a full-duplex, real-time wireless light communication system using 275 nm DUV LEDs is proposed.
Linning Wang +5 more
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EDFA Technical Articles, 2001
Abstract This is the second article in a two-part series on deep ultraviolet (DUV) microscopy. The first part, published in the February 2000 issue of EDFA, discusses the working principles and capabilities of the method and the types of applications for which it is suited.
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Abstract This is the second article in a two-part series on deep ultraviolet (DUV) microscopy. The first part, published in the February 2000 issue of EDFA, discusses the working principles and capabilities of the method and the types of applications for which it is suited.
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Deep Ultraviolet Smith-Purcell Radiation
Conference on Lasers and Electro-Optics, 2018We demonstrated high order Smith-Purcell radiation in deep ultraviolet wavelength region. Having free electrons passing through a slot in a 2μm-long two-dimensional Aluminum grating, the radiation with wavelength as short as 237nm has been derived.
Yu Ye +3 more
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Deep-Ultraviolet Light-Emitting Diodes
IEEE Transactions on Electron Devices, 2010Compact solid-state deep-ultraviolet (DUV) light-emitting diodes (LEDs) go far beyond replacing conventional DUV sources such as mercury lamps. DUV LEDs enable new applications for air, water, and surface sterilization and decontamination, bioagent detection and identification, UV curing, and biomedical and analytical instrumentation.
Michael S. Shur, Remis Gaska
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Deep Ultraviolet Nonlinear Optical Materials
Chemistry of Materials, 2016Deep ultraviolet (absorption edge 6.2 eV) nonlinear optical (NLO) materials are of current interest owing to their technological applications and materials design challenges. Technologically, the materials are used in laser systems, atto-second pulse generation, semiconductor manufacturing, and photolithography.
T. Thao Tran +4 more
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SiC Deep Ultraviolet Avalanche Photodetectors
2010Abstract : During the program, both 4x4 and 8x8 SiC APD arrays have been demonstrated with world-record single photon detection efficiency (SPDE) and dark count rate (DCR). Further advancements have been made with initial work exploring micro-lenses to enhance APD array performance, as well as the demonstration of APDs with 40% single photon detection ...
Joe Campbell +5 more
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Deep Ultraviolet Plasmon Resonance in Aluminum Nanoparticle Arrays
ACS Nano, 2013Small aluminum nanoparticles have the potential to exhibit localized surface plasmon resonances in the deep ultraviolet region of the electromagnetic spectrum, however technical and scientific challenges make it difficult to attain this limit. We report the fabrication of arrays of Al/Al2O3 core/shell nanoparticles with a metallic-core diameter between
Maidecchi +10 more
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Far-Ultraviolet Spectroscopy and Deep-Ultraviolet Spectroscopy: Industrial Applications
2015FUV or DUV absorption spectrum has very strong absorptivity with a steep absorption edge. Since the spectral changes in the intensity, position, and bandwidth of the band are observed sensitively even at the portion of the tail band, these spectra can be applied for a powerful method in industrial analytical applications.
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Liquid immersion deep-ultraviolet interferometric lithography
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1999An apparatus for deep-ultraviolet interferometric lithography is described, in which the interfering beams illuminate the substrate through a fused silica prism and a layer of index-matching liquid. The liquid-immersion technique was found to be compatible with a commercially available, chemically amplified photoresist.
J. A. Hoffnagle +3 more
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Deep-ultraviolet scatterometry for nanoparticle detection
SPIE Proceedings, 2000The detection of surface particles is an important part of contamination control in semiconductor manufacturing. However, the minimum particle size required to be detected has been becoming smaller as integrated-circuit geometries shrink. Current visible-light detection systems can detect particles down to around 50 nm in polystyrene-latex-equivalent ...
Benjamin D. Buckner, E. Dan Hirleman
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