Results 231 to 240 of about 7,150 (272)

Selective-Area Deposition of Indium and Its Plasmonic Properties. [PDF]

open access: yesACS Appl Opt Mater
Dede D   +10 more
europepmc   +1 more source

Droplet etching with indium – Intermixing and lattice mismatch

Journal of Crystal Growth, 2019
Abstract In contrast to Indium droplets the usage of Ga or Al droplets for the local droplet etching (LDE) technique is well established. It has been shown previously that In-droplets or In-alloys can be used for LDE with focus on small hole-depths at low etching temperatures.
Ch Heyn
exaly   +2 more sources

Dynamics of self-assembled droplet etching

Applied Physics Letters, 2009
We study the self-assembled local droplet etching of nanoholes in AlGaAs surfaces with Ga droplets. The data establish an unexpected delay of both the hole drilling process as well as the removal of the liquid material after etching. Furthermore, coarsening by Ostwald ripening is found to reduce the droplet density before drilling.
Ch Heyn, A Stemmann, Heyn Ch
exaly   +2 more sources

Molecular‐level etching by electrospray droplet impact

Surface and Interface Analysis, 2008
Abstract A novel ionization method, electrospray droplet impact (EDI), has been developed for matrix‐free SIMS. The charged water droplets used in EDI are extremely large cluster ions with masses of about a few 10 6 u.
Yoshitoki Iijima   +2 more
exaly   +2 more sources

Fabrication of superhydrophobic aluminum surface by droplet etching and chemical modification

Colloids and Surfaces A: Physicochemical and Engineering Aspects, 2019
Abstract The development of techniques to fabricate superhydrophobic aluminum surfaces is rapidly maturing, yet the problems of high loss of material and complex preparation still persist. To address this, a simple method that combines droplet etching and chemical modification was used to fabricate a superhydrophobic aluminum surface, with a contact ...
Jiliang Mo, Zhiguang Guo
exaly   +2 more sources

On the mechanism of the micro-droplet etching of silicon wafers for texturization

Materials Science in Semiconductor Processing, 2019
Abstract Polished silicon wafers were used for the present study to remove the effect from surface mechanical damages. It was shown that conventional HF-HNO3-H2O bath wet etching cannot generate any texture on the polished silicon, while the micro-droplet etching (MDE) imposed by vapor from the similar bath can do.
Lang Zhou
exaly   +2 more sources

Control of Morphology and Substrate Etching in InAs/InP Droplet Epitaxy Quantum Dots for Single and Entangled Photon Emitters [PDF]

open access: yesACS Applied Nano Materials, 2022
[Image: see text] We present a detailed atomic-resolution study of morphology and substrate etching mechanism in InAs/InP droplet epitaxy quantum dots (QDs) grown by metal–organic vapor phase epitaxy via cross-sectional scanning tunneling microscopy (X ...
Raja S R Gajjela   +2 more
exaly   +3 more sources

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