Results 221 to 230 of about 225,755 (264)

Distinct Electrification Regimes at Solid-Liquid Interfaces Revealed by Water Isotope Substitution. [PDF]

open access: yesJ Phys Chem C Nanomater Interfaces
Arkan MZ   +9 more
europepmc   +1 more source

Droplet etching with indium – Intermixing and lattice mismatch

Journal of Crystal Growth, 2019
Abstract In contrast to Indium droplets the usage of Ga or Al droplets for the local droplet etching (LDE) technique is well established. It has been shown previously that In-droplets or In-alloys can be used for LDE with focus on small hole-depths at low etching temperatures.
Christian Heyn, W Hansen
exaly   +2 more sources

Study on the asymmetry of nanopore in Al droplet etching

Optical and Quantum Electronics, 2021
In the local droplet etching (LDE) method, the fine split structure (FSS) of quantum dots (QDs) is directly related to the shape of the nanopores formed after annealing. The formation of highly symmetrical nanoporous is the key to the preparation of GaAs/AlGaAs QDs with small FSS.
Jiaxin Shen   +12 more
openaire   +1 more source

Dynamics of self-assembled droplet etching

Applied Physics Letters, 2009
We study the self-assembled local droplet etching of nanoholes in AlGaAs surfaces with Ga droplets. The data establish an unexpected delay of both the hole drilling process as well as the removal of the liquid material after etching. Furthermore, coarsening by Ostwald ripening is found to reduce the droplet density before drilling.
Christian Heyn, A Stemmann, W Hansen
exaly   +2 more sources

Molecular-level etching by electrospray droplet impact

Surface and Interface Analysis, 2008
Abstract A novel ionization method, electrospray droplet impact (EDI), has been developed for matrix‐free SIMS. The charged water droplets used in EDI are extremely large cluster ions with masses of about a few 10 6 u.
Kenzo Hiraoka   +2 more
exaly   +2 more sources

On the mechanism of the micro-droplet etching of silicon wafers for texturization

Materials Science in Semiconductor Processing, 2019
Abstract Polished silicon wafers were used for the present study to remove the effect from surface mechanical damages. It was shown that conventional HF-HNO3-H2O bath wet etching cannot generate any texture on the polished silicon, while the micro-droplet etching (MDE) imposed by vapor from the similar bath can do.
Lang Zhou
exaly   +2 more sources

Mechanism and applications of local droplet etching

Journal of Crystal Growth, 2011
We give an overview on the fabrication and applications of deep nanoholes in semiconductor surfaces generated by self-assembled drilling with liquid metal droplets as etchant. The method is fully compatible with conventional molecular beam epitaxy equipment.
Ch. Heyn   +6 more
openaire   +1 more source

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