Results 11 to 20 of about 17,748 (263)
Optimization of piezoelectric MEMS process on Sr and La co-doped PZT thin films [PDF]
Journal of Advanced Dielectrics, 2020 Doped lead–zirconate–titanate (PZT) thin films are preferred for the development of micro–electro–mechanical systems (MEMS)-based acoustic sensors because of their inherent higher dielectric and piezoelectric coefficients.
M. Kathiresan +6 more
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Research Review of InAs/GaSb Superlattice Mesa Etching Process [PDF]
Hangkong bingqiThis paper reviews the research on InAs/GaSb superlattice mesa etching technology. The physicochemi-cal mechanism and parameter control of wet and dry etching are analyzed to elucidate the influence of process conditions on mesa morphology, so as to ...
Zhang Xiangyu, Jiang Dongwei, He Wen, Wang Jinzhong
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Nihon Kikai Gakkai ronbunshu, 2022 Dry etching using oxygen plasma was conducted on a single-point cutting tool made of nano-polycrystalline diamond to clarify the shapeable cutting edge radius (CER). The CER of the tool was measured by atomic force microscopy (AFM).
Takuya SEMBA +2 more
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Micromachines, 2022 Metalenses play an important role in optoelectronic integrated devices, given their advantages in miniaturization and integration. Due to its high aspect ratio subwavelength structure, fabricating metalenses requires a high-level dry etching technology ...
Yicheng Zhu +7 more
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Angstrom-scale flatness using selective nanoscale etching
Beilstein Journal of Nanotechnology, 2017 The realization of flat surfaces on the angstrom scale is required in advanced devices to avoid loss due to carrier (electron and/or photon) scattering.
Takashi Yatsui +2 more
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Applied Sciences, 2022 During the oxide layer etching process, particles in capacitively coupled plasma etching equipment adhere to the wafer edge and cause defects that reduce the yield from semiconductor wafers.
Ching-Ming Ku, Stone Cheng
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The use of one-component plasma in the icp-rie etching process of periodic structures for applications in photodetector arrays [PDF]
Metrology and Measurement Systems, 2023 The paper presents the effect of ICP-RIE etching time using one-component plasma on various parameters of an InAs/GaSb type II superlattice matrix. In the studies, two samples used at different BCl3 gas flow rates were compared and it was found that ...
Marta Różycka +5 more
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AIP Advances, 2014 Nanotip arrays with high aspect ratio, which have attracted much attention due to their potential applications, have been fabricated by many methods. Dry etching combined with self-assembly masks is widely used because of the convenience of dry etching ...
Xinshuai Zhang +4 more
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Tetramethylammonium hydroxide (TMAH) treatment of dry-etched trenches on (010) β-Ga2O3 to enhance trench profiles [PDF]
AIP AdvancesWe demonstrated heated tetramethylammonium hydroxide (TMAH) etching (25 wt. % concentration, at 90 °C) as an effective post-dry-etch treatment for improving dry-etched trench profiles on (010) β-Ga2O3. This treatment successfully converted rough, tapered
Takayoshi Oshima
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IEEE Journal of the Electron Devices Society, 2021 The liquid phase chemical enhanced oxidation (LPCEO) technique was applied to achieve planarized isolation of a high-indium-content In0.52Al0.48As/In0.8Ga0.2As metamorphic high-electron-mobility transistor (MHEMT).
Houng-Wei Chen +4 more
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