Results 51 to 60 of about 18,248 (259)

Edge lithography based on aluminum dry etching

open access: yesMicro and Nano Engineering
Traditional nanolithography methods, such as electron beam or ion beam lithography, can be expensive and slow, limiting their applications. Edge lithography offers a promising alternative for efficiently and effectively creating nanoscale patterns using ...
Chenxu Zhu   +4 more
doaj   +1 more source

Reconstructing Quantum Dot Surfaces via Dual‐Functional Ligand Pairing Enables Efficient Shortwave Infrared Optoelectronics

open access: yesAdvanced Functional Materials, EarlyView.
This work presents a ligand‐pairing strategy that reconstructs lead sulfide quantum dot surfaces for efficient short‐wave infrared optoelectronics. A low‐reactivity thiourea precursor combined with hydrobromic acid enables monodisperse and fully passivated quantum dots.
Dongeon Kim   +16 more
wiley   +1 more source

Dry etching of single-point cutting tool made of nanopolycrystalline diamond using oxygen plasma (Translated) (Shapeable cutting-edge radius)

open access: yesMechanical Engineering Journal
Dry etching with oxygen plasma was performed on a single-point cutting tool composed of nano-polycrystalline diamond to elucidate the shapeable cutting-edge radius (CER).
Takuya SEMBA   +2 more
doaj   +1 more source

Polymer Substrates for Flexible Sensors: Advances and Contributions to Smart Agriculture

open access: yesAdvanced Functional Materials, EarlyView.
This review comprehensively summarizes recent advances in polymer‐based flexible sensors for smart agriculture, focusing on polymer substrate design, interface engineering, and applications in soil, plant, animal, aquaculture, and post‐harvest monitoring.
Yihui Li   +12 more
wiley   +1 more source

Surface Nanostructures Formed by Phase Separation of Metal Salt–Polymer Nanocomposite Film for Anti-reflection and Super-hydrophobic Applications

open access: yesNanoscale Research Letters, 2017
This paper describes a simple and low-cost fabrication method for multi-functional nanostructures with outstanding anti-reflective and super-hydrophobic properties.
Celal Con, Bo Cui
doaj   +1 more source

Tunable Complementary Doping Strategy Enables High‐Performance Homo‐Channel CMOS in Monolayer WSe2

open access: yesAdvanced Functional Materials, EarlyView.
Polarity‐selective modulation enables a homo‐channel WSe2 CMOS platform from a single 2D semiconductor. MoOx and AlN tune WSe2 toward p‐ and n‐type operation, respectively, yielding complementary FETs and inverters with balanced switching, high voltage gain, low static power, and promising scalability for 2D logic integration.
Kuan‐Hsiang Chiu   +7 more
wiley   +1 more source

Numerical simulation of plasma etching process with AAO mask based on PIC/MCC model

open access: yesChemPhysMater
This paper presents a Particle-in-Cell Monte Carlo Collision (PIC/MCC) numerical simulation to investigate plasma etching processes utilizing an anodic aluminum oxide (AAO) mask.
Zeping Li   +4 more
doaj   +1 more source

Mitigating Concentration Polarization in Dry‐Processed Ultra‐Thick Cathodes Using a Low‐Viscosity Electrolyte With Soft Li+ Solvation

open access: yesAdvanced Functional Materials, EarlyView.
A low‐viscosity, soft‐solvating methyl ethanoate (ME)‐based electrolyte facilitates electrolyte infiltration into dense dry‐processed ultra‐thick NCM622 cathodes while reducing Li+ desolvation barriers at Li‐metal anodes. Balanced cathode‐scale ion transport and anode‐side interfacial kinetics mitigate concentration polarization and interfacial ...
Jae Bin Park   +11 more
wiley   +1 more source

Nanofabrication of Vertically Aligned 3D GaN Nanowire Arrays with Sub-50 nm Feature Sizes Using Nanosphere Lift-off Lithography

open access: yesProceedings, 2017
Vertically aligned 3D gallium nitride (GaN) nanowire arrays with sub-50 nm feature sizes were fabricated using a nanosphere lift-off lithography (NSLL) technique combined with hybrid top-down etching steps (i.e., inductively coupled plasma dry reactive ...
Tony Granz   +12 more
doaj   +1 more source

On the Formation of Black Silicon Features by Plasma-Less Etching of Silicon in Molecular Fluorine Gas

open access: yesNanomaterials, 2020
In this paper, we study the plasma-less etching of crystalline silicon (c-Si) by F2/N2 gas mixture at moderately elevated temperatures. The etching is performed in an inline etching tool, which is specifically developed to lower costs for products ...
Bishal Kafle   +6 more
doaj   +1 more source

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