Results 61 to 70 of about 1,014,878 (298)

Noise‐Limited Bit Precision in Ferroelectric Synaptic Transistors for High‐Resolution Neuromorphic Computing

Advanced Functional Materials, EarlyView.
Low‐frequency noise spectroscopy defines the resolvable conductance states of synaptic FeFETs by coupling read‐current fluctuation with usable dynamic range. The resulting noise‐limited bit precision establishes a universal, device‐agnostic reliability metric beyond the memory window, enabling quantitative benchmarking and rational design of high ...
Jaehong Park, Yeonseop Shin, Changhyeon Han, Sangwoo Kim, Eunchan Park, Youngchan Cho, Jaehong Min, Hyunjun Ahn, Jaekyoung Park, Cheol‐Woong Yang, Jangsaeng Kim, Daewoong Kwon, Wonjun Shin   +12 more
wiley   +1 more source

Edge lithography based on aluminum dry etching

Micro and Nano Engineering
Traditional nanolithography methods, such as electron beam or ion beam lithography, can be expensive and slow, limiting their applications. Edge lithography offers a promising alternative for efficiently and effectively creating nanoscale patterns using ...
Chenxu Zhu, Aixi Pan, Xiaoli Zhu, Shuo Zheng, Bo Cui   +4 more
doaj   +1 more source

Dynamically Actuated Reconfigurable Topographical Surface Enables Active Control of Implant‐Associated Infections

Advanced Functional Materials, EarlyView.
A dynamically actuated reconfigurable topographical surface (DARTS) integrates contact‐mediated bactericidal nanotopography with programmable mechanical actuation to actively disrupt bacterial biofilms. Dynamic surface reconfiguration enhances bacterial killing and suppresses implant‐associated infections in vivo, providing a new strategy for active ...
Mohammad Asadi Tokmedash, Jihun Lee, J. Scott VanEpps, Sungmin Nam, Jouha Min   +4 more
wiley   +1 more source

Dry etching of single-point cutting tool made of nanopolycrystalline diamond using oxygen plasma (Translated) (Shapeable cutting-edge radius)

Mechanical Engineering Journal
Dry etching with oxygen plasma was performed on a single-point cutting tool composed of nano-polycrystalline diamond to elucidate the shapeable cutting-edge radius (CER).
Takuya SEMBA, Yoshifumi AMAMOTO, Hitoshi SUMIYA   +2 more
doaj   +1 more source

A systematic approach to process selection in MEMS [PDF]

, 2006
A systematic approach is developed to select manufacturing Process Chains for the generic elements of a MEMS device. A database of MEMS Process Chains and their attendant process attributes is developed from an extensive review of the literature, and ...
Quinn, D.J., Ashby, M.F., Fleck, N.A., Spearing, S.M.   +3 more
core   +1 more source

Recent advances in dry etching processes for InP-based materials

, 2022
S.246-251The advances towards high-quality dry etching techniques for InP-based materials are reviewed, including recent results on process induced damage.
Niggebrugge, U.
core   +1 more source

Chitin‐Derived Carbon‐Metal Functional Materials

Advanced Functional Materials, EarlyView.
Functional carbon materials are synthesized from combination of biopolymer (chitin) and iron precursors. The resultant material exhibits superior surface area and adsorptive properties compared to carbon materials synthesized directly from pure chitin.
Herry Fang, Chao Hsuan (Joseph) Sung, Haitao Yu, Ezra Sarmiento, Katarina Kotanchek, Ryan Christopher Lee, Michelle Chan, David Kisailus   +7 more
wiley   +1 more source

Surface Nanostructures Formed by Phase Separation of Metal Salt–Polymer Nanocomposite Film for Anti-reflection and Super-hydrophobic Applications

Nanoscale Research Letters, 2017
This paper describes a simple and low-cost fabrication method for multi-functional nanostructures with outstanding anti-reflective and super-hydrophobic properties.
Celal Con, Bo Cui
doaj   +1 more source

On the Formation of Black Silicon Features by Plasma-Less Etching of Silicon in Molecular Fluorine Gas

Nanomaterials, 2020
In this paper, we study the plasma-less etching of crystalline silicon (c-Si) by F2/N2 gas mixture at moderately elevated temperatures. The etching is performed in an inline etching tool, which is specifically developed to lower costs for products ...
Bishal Kafle, Ahmed Ismail Ridoy, Eleni Miethig, Laurent Clochard, Edward Duffy, Marc Hofmann, Jochen Rentsch   +6 more
doaj   +1 more source

Nanostructure Fabrication: Dry Etching Damage

, 1991
Although the directed energy and chemical reactivity of dry etching permits the fabrication of nanostructures with precise geometries, it also causes unwanted electrical and optical changes to the surface, changes generally referred to as “damage”.This ...
P.D. Wang, N.I. Cameron, R. Cheung, N.P. Johnson, M. Rahman, G.F. Doughty, C.D.W. Wilkinson, M.A. Foad   +7 more
core   +1 more source