Results 71 to 80 of about 1,014,878 (298)

Bio‐Inspired Artificial Ionic Mechanoreceptor

open access: yesAdvanced Functional Materials, EarlyView.
A skin‐inspired artificial mechanoreceptor based on ionic interactions is presented for biomimetic tactile sensing. Pressure‐driven ionic redistribution within microfluidic channels generates a self‐powered electrical signal without external bias. The generated waveform exhibits mechanoreceptor‐like temporal features, including overshoot and undershoot,
Mohammad Akbari   +4 more
wiley   +1 more source

Nanofabrication of Vertically Aligned 3D GaN Nanowire Arrays with Sub-50 nm Feature Sizes Using Nanosphere Lift-off Lithography

open access: yesProceedings, 2017
Vertically aligned 3D gallium nitride (GaN) nanowire arrays with sub-50 nm feature sizes were fabricated using a nanosphere lift-off lithography (NSLL) technique combined with hybrid top-down etching steps (i.e., inductively coupled plasma dry reactive ...
Tony Granz   +12 more
doaj   +1 more source

Concentrator cell methodology in the regeneration and recycle of chromium etching solutions using membrane technology [PDF]

open access: yes, 2006
The regeneration of chromium (VI) and the recovery of etched copper from chromium etching solutions by electrodialysis is improved by the addition of a concentrator cell, using ion exchange resins or activated carbon cloth as concentrator media, in the ...
Ganguli, B, Grimes, SM, Chaudhary, AJ
core   +1 more source

Dirac‐Source Linear X‐Ray Detection Diode

open access: yesAdvanced Functional Materials, EarlyView.
Monolayer graphene imparts near linear current‐voltage behavior to a perovskite X‐ray detection diode, contrasting with conventional diode‐like responses. Exploiting graphene's Dirac dispersion and a Schottky‐like back‐to‐back junction, the device achieves six‐orders‐of‐magnitude dark current suppression while retaining linearity over 200 V, enabling ...
Babar Shabbir   +8 more
wiley   +1 more source

Numerical simulation of plasma etching process with AAO mask based on PIC/MCC model

open access: yesChemPhysMater
This paper presents a Particle-in-Cell Monte Carlo Collision (PIC/MCC) numerical simulation to investigate plasma etching processes utilizing an anodic aluminum oxide (AAO) mask.
Zeping Li   +4 more
doaj   +1 more source

Si and GaAs dry etching utilizing showered electron-beam assisted etching through Cl2 gas [PDF]

open access: yes
Matsui S., Watanabe H.. Si and GaAs dry etching utilizing showered electron-beam assisted etching through Cl2 gas. Applied Physics Letters, 59, 18, 2284.
Matsui, S., Watanabe, H.
core   +1 more source

Effects of a photo-assisted electrochemical etching process removing dry-etching damage in GaN [PDF]

open access: yes, 2018
We investigated the ability of a photo-assisted electrochemical (PEC) etching process to remove the damage that dry etching causes in the near-surface region of GaN samples.
Takeda, Kentaro   +5 more
core   +1 more source

CO2‐to‐CO Conversion in a Gas‐Fed, Zero‐Gap, PEM Electrolyzer Enabled by Polycations and Nitrogen‐Doped Carbon‐Supported Cobalt Nanoparticles

open access: yesAdvanced Functional Materials, EarlyView.
A gas‐fed, zero‐gap, PEM CO2 electrolyzer is realized by incorporating PDDA+ ions onto the carbonaceous Co/N‐C electrocatalyst, with gaseous H2 and CO2 fed into the anode and cathode, respectively. Operating without an aqueous electrolyte, the system sustains a peak FECO of 65.1% at 100 mA cm−2. ABSTRACT Electrochemical carbon dioxide reduction (ECO2R)
Yuen Leong Chow   +6 more
wiley   +1 more source

Advances in Solution‐Processed Textile Triboelectric Nanogenerators: Ink Formation, Processing Strategies, Applications, and Challenges

open access: yesAdvanced Functional Materials, EarlyView.
Advanced ink systems for solution‐processed textile triboelectric nanogenerators are systematically summarized, spanning conductive, tribo‐negative, and tribo‐positive layers. By connecting ink chemistry, deposition methods, and device function, the present review reveals the key governing principles of solution development and highlights practical ...
Xinlong Sun, Stephen Beeby
wiley   +1 more source

Dry etching of metallization [PDF]

open access: yes, 1983
The production dry etch processes are reviewed from the perspective of microelectronic fabrication applications. The major dry etch processes used in the fabrication of microelectronic devices can be divided into two categories - plasma processes in ...
Bollinger, D.
core  

Home - About - Disclaimer - Privacy