Results 221 to 230 of about 6,063,462 (266)

Electron Beam Induced Film Deposition

Microphysics of Surfaces, Beams and Adsorbates, 1989
A novel method for directly applying material on only a very small area of a substrate (selective deposition) at low temperature has been reported by applying a gas-substrate interface1-7). When an electron beam is irradiated onto a substrate in electron beam Chemical Vapor Deposition (CVD), source gas molecules, adsorbed on a substrate, are ...
Shinji Matsui, Toshinari Ichihashi, Masanobu Mito   +2 more
openaire   +1 more source

Electron beam-induced deposition of tungsten

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1994
Tungsten films were deposited by decomposing films of frozen tungsten hexafluoride (WF6) with an electron beam and then warming the substrate to remove unreacted WF6. Deposition rates increase with increasing beam intensity.
David A. Bell, John L. Falconer, Zhiming Lü, Carol M. McConica   +3 more
openaire   +1 more source

Nanoscale lithography via electron beam induced deposition

Nanotechnology, 2008
We demonstrate the resolution and characteristics of a nanolithography process utilizing electron beam induced deposition (EBID) of W(CO)(6) and C(10)H(8) to define the imaging and masking layers. Lines and dot matrices were defined/written with various electron beam doses onto both polymethylmethacrylate (PMMA) coated silicon substrates (PMMA-Si) and ...
Yingfeng, Guan, Jason D, Fowlkes, Scott T, Retterer, Michael L, Simpson, Philip D, Rack   +4 more
openaire   +2 more sources

A nanosized photodetector fabricated by electron-beam-induced deposition

Nanotechnology, 2009
A sensitive nanosized molybdenum oxide (MoO(x)) photodetector is manufactured at a desired position by electron-beam-induced deposition (EBID). As-deposited MoO(x) had a conductivity approximately 300 S cm(-1). After 2 h annealing at 573 K, the conductivity of nanowires decreased 10 times to approximately 30 S cm(-1) and MoO(x) had photoconductivity ...
K, Makise, K, Mitsuishi, M, Shimojo, K, Furuya   +3 more
openaire   +2 more sources

Wafer-scale automation of electron beam induced depositions

2016 IEEE International Conference on Advanced Intelligent Mechatronics (AIM), 2016
The electron beam induced deposition process is a versatile and promising technology to improve and build a variety of different targets. The technique works in scanning electron microscope environment and is applicable from the micro-down to the nanometer scale. The fundamental working principle is well known and investigated. However, its application
Patrick Elfert, Malte Bartenwerfer, Sergej Fatikow   +2 more
openaire   +1 more source

Proximity Effect in Electron-Beam-Induced Deposition

Japanese Journal of Applied Physics, 2006
Beam induced deposition is versatile technique to fabricate nano-structure. In this paper, the proximity effect in electron beam induced deposition was studied, and the beam scan sequence which minimizes the effect was suggested.
Kazutaka Mitsuishi, Masayuki Shimojo, Masaki Takeguchi, Miyoko Tanaka, Kazuo Furuya   +4 more
openaire   +1 more source

Electron beam induced deposition of iron nanostructures

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2008
Electron beam induced deposition is among the most prospective methods for size- and position-controllable nanofabrication of three-dimensional structures. Direct-write maskless nanostructure fabrication was performed with a scanning electron microscope.
G. Hochleitner, H. D. Wanzenboeck, E. Bertagnolli   +2 more
openaire   +1 more source

Focused electron beam induced deposition of nickel

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2007
Focused electron beam induced depositions of nickel-containing materials obtained by using bis(methylcyclopentadienyl)nickel(II) Ni(C5H4CH3)2 and tetrakis(trifluorophosphine)nickel(0) Ni(PF3)4 as precursors, were compared in terms of chemical composition and electrical resistivity. Ni(PF3)4 decomposed into higher Ni content materials than that obtained
Perentes, A., Sinicco, G., Boero, G., Dwir, B., Hoffmann, P.   +4 more
openaire   +2 more sources

Electron beam induced deposited etch masks

Microelectronic Engineering, 2009
In this paper we present a method based on electron beam induced deposition (EBID) to fabricate small electrodes with sub-10nm gaps as required e.g. in single electron devices. EBID provides nanometer resolution combined with a relatively high throughput and reproducibility. Some known drawbacks of EBID are the limited choice of materials, inclusion of
C.Th.H. Heerkens, M.J. Kamerbeek, W.F. van Dorp, C.W. Hagen, J. Hoekstra   +4 more
openaire   +1 more source

Applications of Electron Beam Induced Deposition in nanofabrication

2008 7th International Caribbean Conference on Devices, Circuits and Systems, 2008
This paper presents applications in which electron beam induced deposition (EBID) is used to characterize, analyze, and fabricate, nanostructures and devices. High aspect ratio cylindrical ultra sharp (CUS) atomic force microscope (AFM) probe tips are grown on discarded AFM tips using EBID.
Jay A. Bieber, Javier F. Pulecio, Wilfrido A. Moreno   +2 more
openaire   +1 more source