Results 231 to 240 of about 6,063,462 (266)
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High-resolution electron-beam induced deposition

Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1988
A finely focused electron beam is used as a source of energy to decompose molecules, e.g., organometallics or hydrocarbons, adsorbed on the surface of a substrate. Films deposited by these means can be used as etch mask for reactive ion etching, as an absorber for various types of radiation, or directly as part of a device structure.
H. W. P. Koops   +3 more
openaire   +1 more source

Evolution of the nanostructure of deposits grown by electron beam induced deposition

Applied Physics Letters, 2008
Environmental scanning electron microscopy (ESEM) was used to perform electron beam induced deposition (EBID) using a WF6 precursor. The deposits consist of WO3 nanocrystals embedded in an amorphous matrix. Oxide formation is attributed to residual oxidizers present in the ESEM chamber during EBID.
Li, Juntao   +5 more
openaire   +2 more sources

Dynamic profile calculation of deposition resolution by high-energy electrons in electron-beam-induced deposition

Ultramicroscopy, 2005
The effect of the accelerating voltage of incident electrons on the resolution of electron-beam-induced deposition was investigated by a dynamic Monte Carlo profile simulator which includes the electron scattering in the already grown deposit structure.
K, Mitsuishi   +4 more
openaire   +2 more sources

Scanning electron beam induced deposition for conductive tip modification

2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS), 2012
In this study, we have developed conductive tips with high aspect ratio and good sharpness by scanning electron beam induced deposition (SEBID) method. The structure and morphology of modified conductive tips were performed by analytical transmission electron microscopy (TEM) methods.
P. L. Chen   +5 more
openaire   +1 more source

Strategies for the immobilization of nanoparticles using electron beam induced deposition

Nanotechnology, 2008
The mechanism of electron-beam-induced immobilization of nanoparticles on a substrate has been studied both experimentally and theoretically. Experiments have been performed for the case of 200-350 nm Co-Ni nanoparticles secured to a substrate using a 30 keV electron beam.
Daniel J, Burbridge   +3 more
openaire   +2 more sources

Technology basis and perspectives on focused electron beam induced deposition and focused ion beam induced deposition

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2014
Abstract The main characteristics of focused electron beam induced deposition (FEBID) and focused ion beam induced deposition (FIBID) are presented. FEBID and FIBID are two nanopatterning techniques that allow the fabrication of submicron patterns with nanometer resolution on selected locations of any kind of substrate, even on highly structured ...
openaire   +1 more source

Electron-Beam-Induced Deposition

2012
Mélanie Auffan   +56 more
openaire   +1 more source

Focused, Nanoscale Electron-Beam-Induced Deposition and Etching

Critical Reviews in Solid State and Materials Sciences, 2006
Jason Fowlkes   +2 more
exaly  

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