Results 231 to 240 of about 6,063,462 (266)
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High-resolution electron-beam induced deposition
Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1988A finely focused electron beam is used as a source of energy to decompose molecules, e.g., organometallics or hydrocarbons, adsorbed on the surface of a substrate. Films deposited by these means can be used as etch mask for reactive ion etching, as an absorber for various types of radiation, or directly as part of a device structure.
H. W. P. Koops +3 more
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Evolution of the nanostructure of deposits grown by electron beam induced deposition
Applied Physics Letters, 2008Environmental scanning electron microscopy (ESEM) was used to perform electron beam induced deposition (EBID) using a WF6 precursor. The deposits consist of WO3 nanocrystals embedded in an amorphous matrix. Oxide formation is attributed to residual oxidizers present in the ESEM chamber during EBID.
Li, Juntao +5 more
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Ultramicroscopy, 2005
The effect of the accelerating voltage of incident electrons on the resolution of electron-beam-induced deposition was investigated by a dynamic Monte Carlo profile simulator which includes the electron scattering in the already grown deposit structure.
K, Mitsuishi +4 more
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The effect of the accelerating voltage of incident electrons on the resolution of electron-beam-induced deposition was investigated by a dynamic Monte Carlo profile simulator which includes the electron scattering in the already grown deposit structure.
K, Mitsuishi +4 more
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Scanning electron beam induced deposition for conductive tip modification
2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS), 2012In this study, we have developed conductive tips with high aspect ratio and good sharpness by scanning electron beam induced deposition (SEBID) method. The structure and morphology of modified conductive tips were performed by analytical transmission electron microscopy (TEM) methods.
P. L. Chen +5 more
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Strategies for the immobilization of nanoparticles using electron beam induced deposition
Nanotechnology, 2008The mechanism of electron-beam-induced immobilization of nanoparticles on a substrate has been studied both experimentally and theoretically. Experiments have been performed for the case of 200-350 nm Co-Ni nanoparticles secured to a substrate using a 30 keV electron beam.
Daniel J, Burbridge +3 more
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Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2014
Abstract The main characteristics of focused electron beam induced deposition (FEBID) and focused ion beam induced deposition (FIBID) are presented. FEBID and FIBID are two nanopatterning techniques that allow the fabrication of submicron patterns with nanometer resolution on selected locations of any kind of substrate, even on highly structured ...
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Abstract The main characteristics of focused electron beam induced deposition (FEBID) and focused ion beam induced deposition (FIBID) are presented. FEBID and FIBID are two nanopatterning techniques that allow the fabrication of submicron patterns with nanometer resolution on selected locations of any kind of substrate, even on highly structured ...
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Focused, Nanoscale Electron-Beam-Induced Deposition and Etching
Critical Reviews in Solid State and Materials Sciences, 2006Jason Fowlkes +2 more
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