Results 31 to 40 of about 81,648 (296)
Increasing optical metamaterials functionality [PDF]
, 2005 Gold Split Ring Resonators (SRRs) were fabricated on silicon substrates by electron beam lithography and lift-off, with overall dimensions of approximately 200 nm. Reflectance spectra from the SRRs are similar to those published elsewhere.
Chong, H.M. +6 more
core +1 more source
Inverse design of high-NA metalens for maskless lithography
Nanophotonics, 2023 We demonstrate an axisymmetric inverse-designed metalens to improve the performance of zone-plate-array lithography (ZPAL), one of the maskless lithography approaches, that offer a new paradigm for nanoscale research and industry.
Chung Haejun +4 more
doaj +1 more source
The Validation of Various Technological Factors Impact on the Electron Beam Lithography Process
Advances in Electrical and Electronic Engineering, 2021 One of the most significant processes in micro- and nanoelectronics technology is Electron Beam Lithography (EBL). This technique maintains a leading role in extremely high-resolution structures fabrication process with micro- and nanometer dimensions ...
Agnieszka Zawadzka +2 more
doaj +1 more source
Journal of Advanced Mechanical Design, Systems, and Manufacturing, 2016 Roll-to-roll nanoimprint lithography (RTR-NIL) has received considerable attention because it permits large-area nanopatterning with both high resolution and high throughput.
Kai OJIMA +3 more
doaj +1 more source
Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam Lithography
Nanomaterials, 2023 Micro/nano patterns based on quantum dots (QDs) are of great interest for applications ranging from electronics to photonics to sensing devices for biomedical purposes.
Taewoo Ko +4 more
doaj +1 more source
Dual field alignment display and control for electron micropattern generator [PDF]
, 1972 Application of electron beam lithography to replace photolithography process in fabrication of integrated circuits is discussed. Procedure for using electron beam lithography equipment is described.
Malmberg, P. R., Okeeffe, T. W.
core +1 more source
Enhanced Resolution of Poly-(Methyl Methacrylate) Electron Resist by Thermal Processing
, 2009 Granular nanostructure of electron beam resist had limited the ultimate resolution of electron beam lithography. We report a thermal process to achieve a uniform and homogeneous amorphous thin film of poly methyl methacrylate electron resist.
Broers +3 more
core +1 more source
Photonic Engineering Enables All‐Passive Upconversion Imaging with Low‐Intensity Near‐Infrared Light
Advanced Functional Materials, EarlyView.A passive upconversion imaging system enables the observation of scenes illuminated by low‐intensity incoherent near‐infrared light from 750 to 930 nm, by converting it into the visible without the use of external power. The upconverter is enabled by triplet–triplet annihilation in a bulk heterojunction, with absorption enhanced by plasmonic resonators
Rabeeya Hamid +13 more
wiley +1 more source
Residue-free fabrication of high-performance graphene devices by patterned PMMA stencil mask
AIP Advances, 2014 Two-dimensional (2D) atomic crystals and their hybrid structures have recently attracted much attention due to their potential applications. The fabrication of metallic contacts or nanostructures on 2D materials is very common and generally achieved by ...
Fu-Yu Shih +7 more
doaj +1 more source
Micro and Nano Engineering, 2020 In the past 2 decades silsesquioxane has gained attention in the Electron Beam Lithography community as a negative tone electron-sensitive resist (HSQ) whose advantages (sub-20 nm resolution, high contrast, low Line Edge Roughness, good shape fidelity ...
Th. Mpatzaka +8 more
doaj +1 more source