Results 161 to 170 of about 24,227 (270)

Giant Optical Anisotropy and Visible-Frequency Epsilon-near-Zero in Hyperbolic van der Waals MoOCl<sub>2</sub>. [PDF]

open access: yesNano Lett
Ermolaev G   +16 more
europepmc   +1 more source

From Plasma Chemistry to Adhesion Strength: Mechanical Characterization of Pure Versus Mixed Aminosilane Films for Bonding Polyurea to Aluminum

open access: yesPlasma Processes and Polymers, Volume 23, Issue 6, June 2026.
Plasma‐polymerized aminosilane films act as effective primers for bonding polyurea adhesives to aluminum. While pure APTES quadruples joint strength, co‐polymerization with silazanes or other monomers surprisingly degrades adhesion. This reveals a shift in the governing mechanism for adhesion: once a threshold of reactive surface amines is available ...
Thomas D. Michl   +13 more
wiley   +1 more source

The Effects of Surface Spin Polarization on Copper Oxidation by Triplet Oxygen. [PDF]

open access: yesACS Nano
Schneider A   +9 more
europepmc   +1 more source

Standardization of integrated ellipsometry for semiconductor manufacturing

open access: yes, 2022
Roeder, G.   +6 more
core  

Spectroscopic Ellipsometry and Cryogenic Capability

open access: yes, 2014
This project focused on ellipsometry, using it to find optical properties of sapphire, and designing a vacuum chamber to expand the temperature range in which we can perform ellipsometry. First, we obtained the anisotropic optical constants of an m-plane
Hollingshad, Arlough
core  

Understanding Plasma–Liquid Interactions and Plasma‐Induced Free‐Radical Polymerisation in Liquid‐Assisted Atmospheric Plasma Polymerisation—Application to Antioxidant Coating

open access: yesPlasma Processes and Polymers, Volume 23, Issue 6, June 2026.
Liquid‐assisted atmospheric plasma polymerisation enables rapid curing of monomer layers into functional polymer films without chemical initiators. This study investigates plasma‐induced free‐radical polymerisation of TMPTA‐PO and how layer thickness and plasma exposure affect curing efficiency, revealing a clear relationship between film thickness and
Angelica Maria Lanza   +7 more
wiley   +1 more source

Impact of Ions and Radicals on Etch Selectivity and Fluorocarbon Polymerization in the Selective Dry Etching of Si0.7Ge0.3

open access: yesPlasma Processes and Polymers, Volume 23, Issue 6, June 2026.
Ion screening in CF4 plasma reduces CFx+ ion flux while maintaining radical fluxes, suppressing fluorocarbon polymer accumulation. This enables smooth SiGe etching with selectivity up to 30:1 in multilayer stacks. ABSTRACT Selective etching of Si0.7Ge0.3 was investigated in CF4 inductively coupled plasma using an ion‐screening approach to decouple ion ...
Joosung Kang   +6 more
wiley   +1 more source

Structure and properties of (Nd,Sr)(Al,Ta)O<sub>3</sub> (NSAT) substrate crystals. [PDF]

open access: yesActa Crystallogr B Struct Sci Cryst Eng Mater
Blukis R   +10 more
europepmc   +1 more source

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