Results 91 to 100 of about 529,742 (380)
Dry etching and sputtering [PDF]
Philosophical Transactions of the Royal Society of London. Series A: Mathematical, Physical and Engineering Sciences, 2003 Dry etching is an important process for micro- and nanofabrication. Sputtering effects can arise in two contexts within a dry-etch process. Incoming ions cause removal of volatile products that arise from the interaction between the dry-etch plasma and the surface to be etched.
Chris D. W. Wilkinson, M. Rahman
openaire +4 more sources
Advanced Engineering Materials, EarlyView.High‐performance nickel‐based superalloys are often not processible in additive manufacturing (AM) due to hot cracking. The findings in this manuscript propose an efficient method to mitigate cracking and enhance mechanical properties of these alloys by producing a metal matrix composite, contributing to the material and process perspective of the AM ...
Klaus Büßenschütt +3 more
wiley +1 more source
Advanced Engineering Materials, EarlyView.The fused filament‐fabricated MAR‐M247 alloy without hot isostatic pressing shows the lowest porosity of 4%. Heat treatment at 1220 °C produces coarse precipitates and carbides. Specimens heat‐treated at 1220 °C exhibit higher tensile strength (683 MPa) and elongation (10%) at room temperature.
Haneen Daoud +7 more
wiley +1 more source
Dental materials journal, 2018 This study evaluated the effects of surface pretreatment with different concentrations of sulfuric acid etching on surface properties and bonding between Polyetheretherketone (PEEK) and a resin composite.
P. Chaijareenont +4 more
semanticscholar +1 more source
Advanced Engineering Materials, EarlyView.Experiments for reinforcing the diffusion bonding plane by the oxide dispersion strengthening effect are presented. Small ceramic particles (0.5 and 50 μm, respectively) are incorporated. Furthermore, ceramic particles help to penetrate stable passivation layers, enabling atomic diffusion across bonding planes. Since a ceramic–metallic interface cannot
Thomas Gietzelt +4 more
wiley +1 more source
The role and action mechanism of inhibitors in solutions for etching steel
Zaštita Materijala, 2015 Acid etching has a major task, regardless of which acid is used, to cancel all corrosion products from objects before it starts to erode base material.
Bosiljka Ljubičić, Saša Mićin
doaj +1 more source
Gold surface with gold nitride–a surface enhanced Raman scattering active substrate [PDF]
, 2009 The nitration of gold surfaces is a nonpolluting method, which can lead to large scale production of substrates with remarkable properties and applications. We present a topographical study of the nanoscale structure of the gold nitride surfaces produced
Alves, Luis +3 more
core +2 more sources
Optimisation of ultrafast laser assisted etching in fused silica.
Optics Express, 2018 Ultrafast laser assisted etching (ULAE) in fused silica is an attractive technology for fabricating three-dimensional micro-components. ULAE is a two-step process whereby ultrafast laser inscription (ULI) is first used to modify the substrate material ...
C. Ross +3 more
semanticscholar +1 more source
Advanced Engineering Materials, EarlyView.A laboratory‐scale procedure is developed to evaluate the efficiency of melt‐cleaning and drossing fluxes during aluminium alloy recycling, studying their effects on melt cleanliness and tensile properties of secondary foundry alloys. This work provides a practical tool for foundries and aluminium refiners to assess the efficiency of salt fluxes in ...
Veronica Milani, Giulio Timelli
wiley +1 more source
Overview of atomic layer etching in the semiconductor industry
, 2015 Atomic layer etching (ALE) is a technique for removing thin layers of material using sequential reaction steps that are self-limiting. ALE has been studied in the laboratory for more than 25 years.
K. J. Kanarik +7 more
semanticscholar +1 more source