Variation of Bulk Etch Rate and some other Etching Parameters with Etching Temperature for Cellulose Nitrate LR-115 Detector [PDF]
مجلة التربية والعلم, 2009 In the present work, the variation of the bulk etch rate and some other etching parameters, such as removed active-layer thickness, track growing rate, track etch rate with etching temperature is measured for the solid-state nuclear track detector (SSNTD)
Ali Hussain
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Toward reliable morphology assessment of thermosets via physical etching: Vinyl ester resin as an example [PDF]
eXPRESS Polymer Letters, 2013 The morphology of peroxide-cured, styrene crosslinked, bisphenol A-based vinyl ester (VE) resin was investigated by atomic force microscopy (AFM) after ‘physical’ etching with different methods.
J. Karger-Kocsis +5 more
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Studying the Effect of Different Etching Parameters on the Physical Properties of Porous Silicon Prepared By Electrochemical Etching [PDF]
Engineering and Technology Journal, 2015 In this work we prepared a porous Silicon (PS) layer by electrochemical etching (ECE) technique using different etching parameters including current density, anodization time and Hydrofluoric (HF) acid concentration.
Haider Amer Khalaf, Uday Muhsin Nayef
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Femtosecond Laser Precision Etching of Silver Layer on Silica Aerogel Surfaces [PDF]
MicromachinesSilica fiber-reinforced silica aerogel (SFRSA) has low dielectric constant, light weight and high temperature resistance characteristics, making it one of the preferred materials for heat-resistant absorptive layers on the surfaces of high-speed aircraft.
Shengtian Lin +3 more
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Al-Mustansiriyah Journal of ScienceBackground: CR-39 nuclear track detectors are widely used in various fields, including science, technology, astronomy, and environmental preservation, to detect and register heavy ions, neutrons, and alpha particles.
Abdulkader Makki Dahham +3 more
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Advanced BCl3-Driven Deep Ion Etching of β-Ga2O3 for Precision High-Aspect-Ratio Nanostructures [PDF]
SensorsGallium oxide-based devices are critical in various applications, including industrial safety, the gas and petroleum sectors, and research environments. However, the deep etching process has not been thoroughly explored.
Badriyah Alhalaili
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Obtaining porous silicon suitable for sensor technology using MacEtch nonelectrolytic etching [PDF]
Технологія та конструювання в електронній апаратурі, 2013 The author suggests using the etching method MacEtch (metal-assisted chemical etching) for production of micro- and nanostructures of porous silicon. The paper presents research results on the morphology structures obtained at different parameters of ...
I. R. Iatsunskyi
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Dry etching of monocrystalline silicon using a laser-induced reactive micro plasma
Applied Surface Science Advances, 2021 Dry etching is a prevalent technique for pattern transfer and material removal in microelectronics, optics and photonics due to its high precision material removal with low surface and subsurface damage.
Robert Heinke +3 more
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Applied Sciences, 2022 During the oxide layer etching process, particles in capacitively coupled plasma etching equipment adhere to the wafer edge and cause defects that reduce the yield from semiconductor wafers.
Ching-Ming Ku, Stone Cheng
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Study of the Pattern Preparation and Performance of the Resistance Grid of Thin-Film Strain Sensors
Micromachines, 2022 The thin-film strain sensor is a cutting-force sensor that can be integrated with cutting tools. The quality of the alloy film strain layer resistance grid plays an important role in the performance of the sensor.
Yunping Cheng +4 more
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