Results 231 to 240 of about 157,681 (294)

Oxygen Plasma-Modified Graphene Composite Membranes for Enhanced Forward Osmosis Performance: Mitigating Reverse Salt Flux and Improving Permeability. [PDF]

Membranes (Basel)
Zhang K, Wu Y, Jiang Y, Han Q, Zhang M, Feng L, Zhang L.   +6 more
europepmc   +1 more source

Dentin and Enamel Exposure on Upper Incisors for Bonding Buccal Laminated Veneers: Method Validation and Ex Vivo Quantification. [PDF]

Int J Dent
Cuny C, Udar M, Canceill T, Blatz MB, Galibourg A.   +4 more
europepmc   +1 more source

Remote Plasma Selective Silicon Etching Enabled Tunable Sub-Fin Process for Improved Parasitic Bottom Channel Control in Gate-All-Around Nanosheet Field-Effect Transistors. [PDF]

Nanomaterials (Basel)
Li J, Gao Y, Zhang DW.
europepmc   +1 more source

Confined Reactivity in the van der Waals Gap beneath Graphene: Supply-Limited Kinetics and Emergent Reaction Pathways. [PDF]

ACS Nano
Mirdamadi H, Wang R, David J, Jiang T, Wang Y, Vařeka K, Dymáček M, Bábor P, Šikola T, Kolíbal M.   +9 more
europepmc   +1 more source

Microgravity-induced wet chemical etching of borosilicate glass enhances the process rate. [PDF]

Sci Rep
Krakos A, Baranowski K, Białas M.
europepmc   +1 more source

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TMAH etching of silicon and the interaction of etching parameters

Sensors and Actuators A: Physical, 1997
Abstract A study of tetramethylammonium hydroxide (TMAH) etching of silicon and the interaction of etching parameters has been carried out. We find that the silicon etch rate increases as the TMAH concentration increases and it reaches a maximum at 4 wt.%. The etch rate of n-type silicon is found to be slightly higher than that of p-type silicon.
Thong, J.T.L., Choi, W.K., Chong, C.W.
openaire   +1 more source

Track etching parameters for plastics

Radiation Effects, 1970
Etchant type, concentration and temperature effect on various plastics track etching ratio and ...
G. E. Blanford, R. M. Walker, J. P. Wefel   +2 more
openaire   +1 more source

Parameter optimization of etching process for a LGP stamper

Neural Computing and Applications, 2012
This study proposes a two-stage system to optimize the etching process parameter for making a light guide plate (LGP) stamper. The multi-quality characteristics of the parameter settings include depth and uniformity of the microstructures formed in the LGP stamper.
Wen-Chin Chen, Yi-Chia Tai, Min-Wen Wang, Hsiang-Cheng Tsai   +3 more
openaire   +1 more source