Analysis of the Dispersion of Electrical Parameters and Characteristics of FinFET Devices
Extensive numerical simulations of FinFET structures have been carried out using commercial TCAD tools. A series of plasma etching steps has been simulated for different process conditions in order to evaluate the influence of plasma pressure ...
Arkadiusz Malinowski +6 more
doaj +1 more source
Overview of FinFET device structure development
With the rapid development of integrated circuit technology, the size of devices continues to shrink. When the channel of the field effect transistor is shortened to 22 nm, the traditional planar field effect transistor no longer meets the development ...
Xiong Qian, Ma Kui, Yang Fashun
doaj +1 more source
BSIM-CMG compact model for IC CAD: from FinFET to Gate-All-Around FET Technology
We discuss the BSIM-CMG compact model for SPICE simulations of any common multi-gate (CMG) device. This is an industry standard model which has been used extensively for FinFETs IC design and simulation, and has now been extended to accurately model gate-
Avirup Dasgupta, Chenming Hu
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In this work, we present a radio frequency (RF) assessment of the nanoscale gallium nitride-silicon-on-insulator fin field-effect transistor (GaN-SOI-FinFET). All the performances of the device were compared with GaN-FinFET and conventional FinFET (Conv.
Ajay Kumar +3 more
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Ultra-low Power FinFET SRAM Cell with Improved Stability Suitable for Low Power Applications [PDF]
In this paper, a new 11T SRAM cell using FinFET technology has been proposed, the basic component of the cell is the 6T SRAM cell with 4 NMOS access transistors to improve the stability and also makes it a dual port memory cell.
Shilpi Birla
doaj +1 more source
Reliability analysis of a CNT-TF-FinFET for hostile temperature
In the concerned research work, an extensive study has been carried out for a newly developed carbon nanotube truncated fin (CNT-TF) FinFET from an analog as well as a linearity point of view.
Praween Kumar Srivastava +2 more
doaj +1 more source
Impact of self-heating on the statistical variability in bulk and SOI FinFETs [PDF]
In this paper for the first time we study the impact of self-heating on the statistical variability of bulk and SOI FinFETs designed to meet the requirements of the 14/16nm technology node.
Alexander, Craig +6 more
core +1 more source
Accurate simulations of the interplay between process and statistical variability for nanoscale FinFET-based SRAM cell stability [PDF]
In this paper we illustrate how by using advanced atomistic TCAD tools the interplay between long-range process variation and short-range statistical variability in FinFETs can be accurately modelled and simulated for the purposes of Design-Technology Co-
Asenov, A. +4 more
core +1 more source
A sub-1-V Bandgap Voltage Reference in 32nm FinFET Technology [PDF]
The bulk CMOS technology is expected to scale down to about 32nm node and likely the successor would be the FinFET. The FinFET is an ultra-thin body multi-gate MOS transistor with among other characteristics a much higher voltage gain compared to a ...
Annema, A.J. +3 more
core +2 more sources
Inverse scaling trends for charge-trapping-induced degradation of FinFETs performance [PDF]
In this paper, we investigate the impact of a single discrete charge trapped at the top oxide interface on the performance of scaled nMOS FinFET transistors.
Amoroso, Salvatore Maria +7 more
core +1 more source

