Results 41 to 50 of about 7,054 (167)

Study of a hysteresis window of FinFET and fully-depleted silicon-on-insulator (FDSOI) MOSFET with ferroelectric capacitor

open access: yesNano Convergence, 2020
In this work, the measured electrical characteristics of a fully depleted silicon-on-insulator (FDSOI) device and fin-shaped field-effect transistor (FinFET), whose gate electrode is connected in series to the bottom electrode of a ferroelectric ...
Chankeun Yoon   +2 more
doaj   +1 more source

Review of Nanosheet Transistors Technology

open access: yesTikrit Journal of Engineering Sciences, 2021
Nano-sheet transistor can be defined as a stacked horizontally gate surrounding the channel on all direction. This new structure is earning extremely attention from research to cope the restriction of current Fin Field Effect Transistor (FinFET ...
Firas .. Agha   +2 more
doaj   +1 more source

A Compendium of Logic Gates Based on Reconfigurable Three‐Independent‐Gate Transistors Realized in FDSOI Hardware

open access: yesAdvanced Electronic Materials, EarlyView.
This work electrically characterizes sixteen logic gates built from three‐independent‐gate reconfigurable transistors fabricated on full‐scale 300 mm wafers using the industrial 22 nm fully depleted FDSOI process of GlobalFoundries. Static and time‐resolved measurements confirm correct operation, including a 1‐bit adder and reconfigurable AOI/OAI ...
Juan P. Martinez   +12 more
wiley   +1 more source

Performance assessment of InGaAs–SOI–FinFET for enhancing switching capability using high-k dielectric

open access: yesMemories - Materials, Devices, Circuits and Systems
In this work, a high-k In0.53Ga0.47As silicon-on-insulator FinFET (InGaAs–SOI–FinFET) is presented for high-switching and ultra-low power applications at 7 nm gate length.
Priyanka Agrwal, Ajay Kumar
doaj   +1 more source

AI‐Guided Co‐Optimization of Advanced Field‐Effect Transistors: Bridging Material, Device, and Fabrication Design

open access: yesAdvanced Intelligent Discovery, EarlyView.
This article outlines how artificial intelligence could reshape the design of next‐generation transistors as traditional scaling reaches its limits. It discusses emerging roles of machine learning across materials selection, device modeling, and fabrication processes, and highlights hierarchical reinforcement learning as a promising framework for ...
Shoubhanik Nath   +4 more
wiley   +1 more source

Impact of channel line-edge roughness on junctionless FinFET

open access: yes, 2015
The impact of channel line-edge roughness (LER) on Junctionless FinFET device (JL-FinFET) is investigated by using the 3-D statistical simulation. Then the substantial influence of its narrowest width of the JL-FinFET is defined and presented.
Zhang, Lining   +11 more
core   +1 more source

Investigation of FinFET as a Temperature Nano-Sensor Based on Channel Semiconductor Type [PDF]

open access: yes, 2017
This paper represents the temperature effect on FinFET transistor and the possibility of using it as a temperature nano-sensor. The MuGFET simulation tool was used to investigate temperature characteristics of the FinFET.
Hashim, Yasir, Yasir Hashim
core   +1 more source

Parametric Analysis of Spiking Neurons in 16 nm Fin Field‐Effect Transistor Technology

open access: yesAdvanced Intelligent Discovery, EarlyView.
Energy efficient computing has driven a shift toward brain‐inspired neuromorphic hardware. This study explores the design of three distinct silicon neuron topologies implemented in 16 nm fin field‐Effect transistor technology. While the Axon‐Hillock design achieves gigahertz throughput, its functional fragility persists. The Morris–Lecar model captures
Logan Larsh   +3 more
wiley   +1 more source

Performance analysis of an efficient montgomery multiplier using 7nm FinFET and junctionless FinFET [PDF]

open access: yes, 2021
The digital multipliers are the assertive sources of power exhaustion in the modern digital systems. To perform most efficient arithmetic based calculations, Montgomery multiplication can be one of the best alternatives for other conventional methods in ...
Mathan, N.   +4 more
core   +1 more source

Introducing 5-nm FinFET technology in Microwind

open access: yes, 2021
This paper describes the implementation of a high performance FinFET-based 5-nm CMOS technology in Microwind. After a general presentation of the electronic market and the roadmap to 1nm technology, design rules and basic metrics for the 5-nm node are ...
Trojman, Lionel, Sicard, Etienne
core   +1 more source

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