Phosphorus monolayer doping (MLD) of silicon on insulator (SOI) substrates [PDF]
This paper details the application of phosphorus monolayer doping of silicon on insulator substrates. There have been no previous publications dedicated to the topic of MLD on SOI, which allows for the impact of reduced substrate dimensions to be probed.
Noel Kennedy +9 more
doaj +6 more sources
The advancement of silicon-on-insulator (SOI) devices and their basic properties
Silicon-on-insulator (SOI) is most promising present-day silicon technology. The use of SOI provides significant benefits over traditional bulk silicon technology in fabrication of many integrated circuits (ICs), and in particular, complementary metal ...
T.E. Rudenko, A.N. Nazarov, V.S. Lysenko
doaj +2 more sources
A Temperature-Compensated Single-Crystal Silicon-on-Insulator (SOI) MEMS Oscillator with a CMOS Amplifier Chip [PDF]
Yong Xie +2 more
exaly +2 more sources
Single mode and polarization independence in the strained silicon-on-insulator rib waveguides [PDF]
In this paper we investigate the most popular silicon waveguide structures in the form of a silicon-on-insulator (SOI) rib waveguide. Single mode and birefringence free conditions in these relatively small waveguides are discussed and the influence of ...
Milošević Milan M. +2 more
doaj +1 more source
On-wafer wideband characterization: a powerful tool for improving the IC technologies
In the present paper, the interest of wideband characterization for the development of integrated technologies is highlighted through several advanced devices, such as 120 nm partially depleted (PD) silicon-on-insulator (SOI) MOSFETs, 120 nm dynamic ...
Dimitri Lederer, Jean-Pierre Raskin
doaj +1 more source
DESIGN AND SIMULATION OF A MULTILAYER SOI-MOSFET STRUCTURE FOR IMPROVING SELF-HEATING EFFECTS [PDF]
In this paper, a new silicon-on-insulator (SOI) device structure is proposed to reduce self-heating effects. Using Si3N4 material is main idea in the structure that has high thermal conductivity respect to silicon dioxide. The device has been verified in
علی اصغر Orouji, سارا Heydari
doaj +1 more source
Preparation of thin-film SOI wafer by low-dose ion implantation
Silicon-on-insulator (SOI) devices have many advantages, such as high speed, low energy consumption, radiation-hard, and high integration. In this paper, the separation by implanted oxygen process under low-dose implantation conditions is studied by the ...
Yuhang Zhang +5 more
doaj +1 more source
Impact of Crosstalk into High Resistivity Silicon Substrate on the RF Performance of SOI MOSFET
Crosstalk propagation through silicon substrate is a serious limiting factor on the performance of the RF devices and circuits. In this work, substrate crosstalk into high resistivity silicon substrate is experimentally analyzed and the impact on the RF
Khaled Ben Ali +2 more
doaj +1 more source
In this paper the results of architecture development, layout designof analytical microsystem-on-chip with the structures "silicon-on-insulator" (SOI) and its elements schemotechnical computer simulation for determine their electrical and time ...
V. V. Dovgiy, I. T. Kohut, V. I. Golota
doaj +1 more source
High-Q TeO2–Si Hybrid Microring Resonators
We present the design and experimental measurement of tellurium oxide-clad silicon microring resonators with internal Q factors of up to 1.5 × 106, corresponding to a propagation loss of 0.42 dB/cm at wavelengths around 1550 nm.
Khadijeh Miarabbas Kiani +3 more
doaj +1 more source

