Results 81 to 90 of about 11,359 (209)

Computational design of two‐dimensional MA2Z4 family field‐effect transistor for future Ångström‐scale CMOS technology nodes

open access: yesInfoMat, Volume 8, Issue 2, February 2026.
Two‐dimensional MA2Z4 such as MoSi2N4 offer a new path to extend transistor scaling beyond the limits of silicon. Due to their exceptional properties, these 2D semiconductors are promising candidates for future Ångström‐scale CMOS technology. This review outlines the computational design and roadmap bridging materials discovery, device design and ...
Che Chen Tho   +11 more
wiley   +1 more source

Improving FinFET Device Parameters Through an Integrated Method of Particle Swarm and Whale Optimization Techniques

open access: yesIET Circuits, Devices and Systems
The geometrical parameters of the fin-shaped field-effect transistor (FinFET) significantly affect the outcomes of the FinFET-based designs. Various machine learning (ML) schemes have been presented to optimize the geometrical parameters of the FinFET ...
Vijayalaxmi Kumbar, Manisha Waje
doaj   +1 more source

Multi-Channel Step FinFET With Spacer Engineering

open access: yesIEEE Access
Multi-channel FinFET ( $\text{M}_{\textbf {ch}}$ -FinFET) is an emerging device having promising use due to its excellent driving capability. In this paper, we have investigated the significance of multiple channels of FinFET configuration.
Rinku Rani Das, Alex James
doaj   +1 more source

Investigation of Linearity Performance and Harmonic distortion between Different Advanced CMOS Devices [PDF]

open access: yesEPJ Web of Conferences
This article introduces a relative study of linearity performance and harmonic distortion among Si junctionless (JL) FinFET, conventional inversion-mode (IM) FinFET, Tunnel FET, and InGaAs MOSFET.
Datta Emona, Basu Arnab, Paul Sayan
doaj   +1 more source

Quantum Enhancement of a S/D Tunneling Model in a 2D MS-EMC Nanodevice Simulator: NEGF Comparison and Impact of Effective Mass Variation

open access: yesMicromachines, 2020
As complementary metal-oxide-semiconductor (CMOS) transistors approach the nanometer scale, it has become mandatory to incorporate suitable quantum formalism into electron transport simulators.
Cristina Medina-Bailon   +8 more
doaj   +1 more source

FinFET Versus Gate-All-Around Nanowire FET: Performance, Scaling, and Variability [PDF]

open access: yes, 2018
Performance, scalability and resilience to variability of Si SOI FinFETs and gate-all-around (GAA) nanowires (NWs) are studied using in-house-built 3D simulation tools.
Elmessary, Muhammad A.   +4 more
core   +1 more source

Unified Analytic Framework for Thickness‐Dependent Transport and Trap‐State Modulation in Ultrathin W:In2O3 Field‐Effect Transistors

open access: yesSmall Structures, Volume 7, Issue 2, February 2026.
We present a unified analytic framework linking subthreshold and above‐threshold conduction in oxide field‐effect transistors by decomposing the drain current into band transport, tail‐state percolation, and interface‐trap diffusion components. Parameter correlation and identifiability analyses enable robust extraction of physical metrics, yielding ...
Mochamad Januar   +3 more
wiley   +1 more source

Sub-60-mV/decade Negative Capacitance FinFET With Sub-10-nm Hafnium-Based Ferroelectric Capacitor

open access: yesIEEE Journal of the Electron Devices Society, 2017
The negative capacitance (NC) of ferroelectric materials has paved the way for achieving sub-60-mV/decade switching feature in complementary metal-oxide-semiconductor (CMOS) field-effect transistors, by simply inserting a ferroelectric thin layer in the ...
Eunah Ko   +4 more
doaj   +1 more source

An Ingenious Design of a High Performance-Low Complexity Image Compressor for Wireless Capsule Endoscopy

open access: yesSensors, 2020
Wireless Capsule Endoscopy is a state-of-the-art technology for medical diagnoses of gastrointestinal diseases. The amount of data produced by an endoscopic capsule camera is huge.
Ioannis Intzes   +2 more
doaj   +1 more source

Ultra‐Fast, Low‐Resistance Nano Gap Electromechanical Switch for Power Gating Applications

open access: yesAdvanced Electronic Materials, Volume 12, Issue 2, 21 January 2026.
An ultra‐small 20 nm air gap and a high‐stiffness architecture enable a MEMS power‐gating switch that combines 0.95 Ω on‐resistance with 30 ns switching while maintaining off‐state leakage below 100 fA. Fabricated below 200 °C, the device is compatible with BEOL and monolithic 3D integration, overcoming the long‐standing resistance–speed trade‐off ...
Tae‐Soo Kim   +5 more
wiley   +1 more source

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