Results 1 to 10 of about 34,551 (258)

In Situ H-Radical Surface Treatment on Aluminum Gallium Nitride for High-Performance Aluminum Gallium Nitride/Gallium Nitride MIS-HEMTs Fabrication [PDF]

open access: yesMicromachines, 2023
In this work, we demonstrated a low current collapse normally on Al2O3/AlGaN/GaN MIS-HEMT with in situ H-radical surface treatment on AlGaN. The in situ atomic pretreatment was performed in a specially designed chamber prior to the thermal ALD-Al2O3 ...
Yannan Yang   +12 more
doaj   +4 more sources

Photonics with Gallium Nitride Nanowires. [PDF]

open access: yesMaterials (Basel), 2022
The surface plasmon resonance in low-dimensional semiconducting materials is a source of valuable scientific phenomenon which opens widespread prospects for novel applications. A systematic study to shed light on the propagation of plasmons at the interface of GaN nanowire is reported.
Alwadai N   +4 more
europepmc   +3 more sources

High power density gallium nitride radio frequency transistors via enhanced nucleation in heteroepitaxy [PDF]

open access: yesNature Communications
Gallium-nitride high-electron-mobility-transistor is an industrial leading contender for high-frequency and high-power radio-frequency applications. However, the record output-power-density has remained stagnant for nearly two decades, limited by high ...
Hong Zhou   +25 more
doaj   +2 more sources

Efficient continuous-wave nonlinear frequency conversion in high-Q gallium nitride photonic crystal cavities on silicon

open access: yesAPL Photonics, 2017
We report on nonlinear frequency conversion from the telecom range via second harmonic generation (SHG) and third harmonic generation (THG) in suspended gallium nitride slab photonic crystal (PhC) cavities on silicon, under continuous-wave resonant ...
Mohamed Sabry Mohamed   +8 more
doaj   +3 more sources

Thermal conductivity of wurtzite gallium nitride

open access: yesВесці Нацыянальнай акадэміі навук Беларусі: Серыя фізіка-тэхнічных навук, 2022
This paper reviews the theoretical and experimental works concerning one of the most important parameters of wurtzite gallium nitride – thermal conductivity.
V. S. Volcheck   +2 more
doaj   +1 more source

A novel hybrid termination structure for vertical gallium nitride Schottky barrier diode by using technology computer aided design simulation

open access: yesElectronics Letters, 2021
Gallium nitride based high‐power electronic devices are now in full swing. However, the phenomenon that the gallium nitride Schottky diodes break down prematurely without reaching the gallium nitride material limit is unsolved.
Jian Li   +4 more
doaj   +1 more source

The Optimizations of MOSFET Contents in EE Undergraduate Course by using the Third Generation Semiconductor (Gallium Nitride) [PDF]

open access: yesE3S Web of Conferences, 2020
Recently, the third generation semiconductor Gallium Nitride based electrical devices earn a more and more popular status in the industry for its easy popularization and cost effectivity.
Yuanlong Chen
doaj   +1 more source

On Stress-Induced Polarization Effect in Ammonothermally Grown GaN Crystals

open access: yesCrystals, 2022
The results of basic ammonothermal crystallization of gallium nitride are described. The material is mainly analyzed in terms of the formation of stress (called stress-induced polarization effect) and defects (threading dislocations) appearing due to a ...
Karolina Grabianska   +6 more
doaj   +1 more source

Progress in Ammonothermal Crystal Growth of Gallium Nitride from 2017–2023: Process, Defects and Devices

open access: yesCrystals, 2023
Gallium nitride continues to be a material of intense interest for the ongoing advancement of electronic and optoelectronic devices. While the bulk of today’s markets for low-performance devices is still met with silicon and blue/UV LEDs derived from ...
Nathan Stoddard, Siddha Pimputkar
doaj   +1 more source

Selective area growth of cubic gallium nitride on silicon (001) and 3C-silicon carbide (001)

open access: yesAIP Advances, 2021
Selective area growth of cubic gallium nitride is investigated in a plasma assisted molecular beam epitaxy setup. 380 μm thick silicon (001) and 10 μm thick 3C-silicon carbide (001), grown on 500 μm silicon (001), were used as substrates and structured ...
F. Meier   +6 more
doaj   +1 more source

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