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High Power Impulse Magnetron Sputtering – HIPIMS

open access: yes, 2014
S.75-99High power impulse magnetron sputtering (HIPIMS) or high power pulse magnetron sputtering is a relatively new technology in the transition from academic research to industrial applications.
R. Bandorf, V. Sittinger, G. Bräuer
exaly   +3 more sources

Properties of TiAlCN/VCN Nanoscale Multilayer Coatings Deposited by Mixed High-Power Impulse Magnetron Sputtering (HiPIMS) and Unbalanced Magnetron Sputtering Processes—Impact of HiPIMS During Coating

open access: yesIEEE Transactions on Plasma Science, 2010
Nanoscale multilayer TiAlCN/VCN coating has been deposited by pure unbalanced magnetron sputtering (UBM) and high-power impulse magnetron sputtering (HiPIMS)-UBM techniques. The V+ HiPIMS etching used in both processes has shown excellent adhesion (Lc > 50) of the coating to the substrate.
Arutiun Ehiasarian, P Eh Hovsepian
exaly   +4 more sources
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Pattern Formation in High Power Impulse Magnetron Sputtering (HiPIMS) Plasmas

Plasma Chemistry and Plasma Processing, 2019
High power impulse magnetron sputtering (HiPIMS) plasmas produce a very energetic growth flux for the synthesis of thin films with superior properties. High power densities in the range of a few $$\hbox {kW}/\hbox {cm}^2$$ are applied to a metal target electrode in short pulses with a length of 10–$$400\,\upmu \hbox {s}$$ and duty cycles of a few ...
Julian Held, Achim von Keudell
exaly   +2 more sources

Origins of ion energy distribution function (IEDF) in high power impulse magnetron sputtering (HIPIMS) plasma discharge [PDF]

open access: yesJournal of Physics D: Applied Physics, 2008
The ion energy distribution function (IEDF) in high power impulse magnetron sputtering (HIPIMS) discharges was studied by plasma sampling energy-resolved mass spectroscopy. HIPIMS of chromium (Cr), titanium (Ti) and carbon ( C) targets in argon (Ar) atmosphere was analysed.
A Hecimovic, K Burcalova, A P Ehiasarian
openaire   +15 more sources

High power impulse magnetron sputtering (HIPIMS) and traditional pulsed sputtering (DCMSP) Ag-surfaces leading to E. coli inactivation

Journal of Photochemistry and Photobiology A: Chemistry, 2012
This study addresses the high power impulse magnetron sputtering (HIPIMS) deposition of Ag-nanoparticle films on polyester and the comparison with films deposited by direct current pulsed magnetron sputtering (DCMSP). The first evidence is presented for the Escherichia coli bacterial inactivation by HIPIMS sputtered polyester compared to Ag-polyester ...
Ewelina Kusiak-Nejman   +2 more
exaly   +2 more sources

Microstructure and mechanical properties of Al-Mg-Ti-B coatings prepared by high power impulse magnetron sputtering (HIPIMS) at room temperature

open access: yesSurface and Coatings Technology, 2017
In this work, Al-Mg-Ti-B coatings were synthesized at room temperature via high power impulse magnetron sputtering (HIPIMS). The as-deposited Al-Mg-Ti-B coatings exhibited a dense and X-ray amorphous microstructure.
Congcong Zhang, Jun Ouyang
exaly   +2 more sources

Impact of self-sputtering in high power impulse magnetron sputtering (HiPIMS) with helium

Journal of Applied Physics, 2023
Conventional magnetron discharge is a widely used technology for many applications. In the last decade, the high current density sputtering regime has been an interesting alternative for tailoring thin film properties. In this paper, we focused on the electrical characterization of the helium magnetron plasma operated at average gas pressure (5 Pa ...
Erwan Morel   +3 more
openaire   +1 more source

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