Results 161 to 170 of about 1,559 (206)

Influence of C₂H₂ Flow Rates on Optical Properties, Surface Roughness, and Residual Stress of Ti/WC Thin Films Deposited on Glass Substrates. [PDF]

Materials (Basel)
Tien CL, Wang YL, Chang YM, Lin SC, Wang CC.   +4 more
europepmc   +1 more source

Influence of carbon ionization increment by adding ne on the bonding, electrical, and tribological properties of carbon thin films deposited by HiPIMS. [PDF]

Sci Rep
Rivera Tello CD, Flores-Ruiz FJ, Pérez Alvarez J, Guerrero de León JA, Farías I, Flores-Cova L, Flores M.   +6 more
europepmc   +1 more source

High-Power Impulse Magnetron Sputter Deposition of Ag on Self-Assembled Au Nanoparticle Arrays at Low-Temperature Dewetting Conditions. [PDF]

ACS Appl Mater Interfaces
Guan T, Liang S, Kang Y, Pensa E, Li D, Liang W, Liang Z, Bulut Y, Reck KA, Xiao T, Guo R, Drewes J, Strunskus T, Schwartzkopf M, Faupel F, Roth SV, Cortés E, Jiang L, Müller-Buschbaum P.   +18 more
europepmc   +1 more source

The Fabrication and Characterization of Surface-Acoustic-Wave and Resistive Types of Ozone Sensors Based on Zinc Oxide: A Comparative Study. [PDF]

Sensors (Basel)
Yan SH, Lee CY.
europepmc   +1 more source

Tuning the optical, electrical, and structural properties of Cu-DLC thin films via simultaneous DC-RF unbalanced magnetron sputtering. [PDF]

Heliyon
Mikhchin A, Hosseini SI, Khodadadi Najaf Abadi S, Mohammadhosseini B, Mehrabian S.   +4 more
europepmc   +1 more source

Vapor Deposition Engineering for Thin-Film Microbatteries: From Nanoscale Ionics to Interface-Integrated Architectures. [PDF]

Nanomicro Lett
Zheng M, Xu X, Wang X, Lin H, Hou C, Khan M, Zhu J, Han S.   +7 more
europepmc   +1 more source

Properties of TiAlCN/VCN Nanoscale Multilayer Coatings Deposited by Mixed High-Power Impulse Magnetron Sputtering (HiPIMS) and Unbalanced Magnetron Sputtering Processes—Impact of HiPIMS During Coating

IEEE Transactions on Plasma Science, 2010
Nanoscale multilayer TiAlCN/VCN coating has been deposited by pure unbalanced magnetron sputtering (UBM) and high-power impulse magnetron sputtering (HiPIMS)-UBM techniques. The V+ HiPIMS etching used in both processes has shown excellent adhesion (Lc > 50) of the coating to the substrate.
Arutiun P Ehiasarian, P Eh Hovsepian
exaly   +4 more sources

High Power Impulse Magnetron Sputtering – HIPIMS

, 2014
S.75-99High power impulse magnetron sputtering (HIPIMS) or high power pulse magnetron sputtering is a relatively new technology in the transition from academic research to industrial applications.
R Bandorf, V Sittinger
exaly   +3 more sources

High power impulse magnetron sputtering (HIPIMS) and traditional pulsed sputtering (DCMSP) Ag-surfaces leading to E. coli inactivation

Journal of Photochemistry and Photobiology A: Chemistry, 2012
This study addresses the high power impulse magnetron sputtering (HIPIMS) deposition of Ag-nanoparticle films on polyester and the comparison with films deposited by direct current pulsed magnetron sputtering (DCMSP). The first evidence is presented for the Escherichia coli bacterial inactivation by HIPIMS sputtered polyester compared to Ag-polyester ...
O Baghriche, Arutiun P Ehiasarian, Ewelina Kusiak-Nejman   +2 more
exaly   +3 more sources

Origins of ion energy distribution function (IEDF) in high power impulse magnetron sputtering (HIPIMS) plasma discharge [PDF]

Journal of Physics D: Applied Physics, 2008
The ion energy distribution function (IEDF) in high power impulse magnetron sputtering (HIPIMS) discharges was studied by plasma sampling energy-resolved mass spectroscopy. HIPIMS of chromium (Cr), titanium (Ti) and carbon ( C) targets in argon (Ar) atmosphere was analysed.
A Hecimovic, K Burcalova, A P Ehiasarian
openaire   +2 more sources