Results 171 to 180 of about 18,610,504 (202)
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2020 7th International Congress on Energy Fluxes and Radiation Effects (EFRE), 2020
The effects of using of the HIPIMS technology for deposition of coatings for various purposes, including CrB, TiAlNiC, and MoHfSiB, are studied. Ceramic targets obtained by self-propagating high-temperature synthesis were used for sputtering. It is shown that the transition from DC to HIPIMS modes increases the structure density, hardness, elastic ...
Philipp Kiryukhantsev-Korneev +1 more
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The effects of using of the HIPIMS technology for deposition of coatings for various purposes, including CrB, TiAlNiC, and MoHfSiB, are studied. Ceramic targets obtained by self-propagating high-temperature synthesis were used for sputtering. It is shown that the transition from DC to HIPIMS modes increases the structure density, hardness, elastic ...
Philipp Kiryukhantsev-Korneev +1 more
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E. coli Inactivation by High-Power Impulse Magnetron Sputtered (HIPIMS) Cu Surfaces
The Journal of Physical Chemistry C, 2011This study reports HIPIMS-sputtered samples of Cu-particulate films with currents at 6 and 60 amps leading to E. coil inactivation. The Cu coverage and nanoparticle structure of the fibers is reported by TEM. Evidence is presented of redox processes in the Cu taking place during E.
Kusiak-Nejman, E. +8 more
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Optical emission spectroscopy of High Power Impulse Magnetron Sputtering (HiPIMS) of CIGS thin films
2014 IEEE 40th Photovoltaic Specialist Conference (PVSC), 2014CuIn 1−x Ga x Se 2 (CIGS) thin films with x = 0, 0.28 and 1 were prepared by the sputtering of Cu, In and Ga in HiPIMS (High Power Impulse Magnetron Sputtering) or DC magnetron and subsequently selenized in an Ar+Se atmosphere. Optical emission spectroscopy (OES) was used to monitor differences in HiPIMS and DC plasma during sputtering of metallic ...
Jiri Olejnicek +8 more
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2013 Abstracts IEEE International Conference on Plasma Science (ICOPS), 2013
Summary form only given. HiPIMS discharges are able to produce a high density plasma (peak electron density 1018 - 1020 m-3) by applying large voltages to a target. Electrons are effectively magnetized by a strong magnetic field (100 mT), and exhibit an E x B drift in the azimuthal direction in the plane of the target.
Sara Gallian +3 more
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Summary form only given. HiPIMS discharges are able to produce a high density plasma (peak electron density 1018 - 1020 m-3) by applying large voltages to a target. Electrons are effectively magnetized by a strong magnetic field (100 mT), and exhibit an E x B drift in the azimuthal direction in the plane of the target.
Sara Gallian +3 more
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Journal of Physics D: Applied Physics, 2013
ZnO films have been reactively deposited on sapphire substrates at 300 °C using a high impulse power magnetron sputtering deposition system and characterized structurally, optically and electronically. The unintentionally doped n-type ZnO films exhibit high transparency, moderate carrier concentration (∼5 × 1018 cm−3) and a Hall mobility of 8.0 cm2 V−1
J G Partridge +4 more
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ZnO films have been reactively deposited on sapphire substrates at 300 °C using a high impulse power magnetron sputtering deposition system and characterized structurally, optically and electronically. The unintentionally doped n-type ZnO films exhibit high transparency, moderate carrier concentration (∼5 × 1018 cm−3) and a Hall mobility of 8.0 cm2 V−1
J G Partridge +4 more
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Annual Technical Conference Proceedings, 2013
TiN coatings were deposited by conventional dc unbalanced magnetron (UBM) sputtering, combined High Power Impulse Magnetron Sputtering (HIPIMS)/UBM and pure HIPIMS sources in an industrial size 4 cathode magnetron sputtering machine with a bias of -50V during deposition.
A.A. Sugurmaran +5 more
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TiN coatings were deposited by conventional dc unbalanced magnetron (UBM) sputtering, combined High Power Impulse Magnetron Sputtering (HIPIMS)/UBM and pure HIPIMS sources in an industrial size 4 cathode magnetron sputtering machine with a bias of -50V during deposition.
A.A. Sugurmaran +5 more
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2016
We have studied the texture evolution of Aluminum nitride (AlN) thin. AlN thin films were deposited on Si (100) substrate by dc magnetron sputtering (dcMS) and High Power Impulse Magnetron Sputtering (HiPIMS) technics. The growth of AlN thin films is observed to occur in two phases, stable hexagonal phase (AlN_H) and cubic phase (AIN_C).
B. Riah +4 more
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We have studied the texture evolution of Aluminum nitride (AlN) thin. AlN thin films were deposited on Si (100) substrate by dc magnetron sputtering (dcMS) and High Power Impulse Magnetron Sputtering (HiPIMS) technics. The growth of AlN thin films is observed to occur in two phases, stable hexagonal phase (AlN_H) and cubic phase (AIN_C).
B. Riah +4 more
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Bi-polar High-Power Impulse Magnetron Sputtering (HiPIMS) Synthesis of High Entropy Carbides
2021Hossain, Mohammad Delower +2 more
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2022 IEEE 39th International Electronics Manufacturing Technology Conference (IEMT), 2022
Siti Noryasmin Jaffar +3 more
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Siti Noryasmin Jaffar +3 more
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