Results 111 to 120 of about 382 (159)

The Fabrication and Characterization of Surface-Acoustic-Wave and Resistive Types of Ozone Sensors Based on Zinc Oxide: A Comparative Study. [PDF]

Sensors (Basel)
Yan SH, Lee CY.
europepmc   +1 more source

Tuning the optical, electrical, and structural properties of Cu-DLC thin films via simultaneous DC-RF unbalanced magnetron sputtering. [PDF]

Heliyon
Mikhchin A, Hosseini SI, Khodadadi Najaf Abadi S, Mohammadhosseini B, Mehrabian S.   +4 more
europepmc   +1 more source

Vapor Deposition Engineering for Thin-Film Microbatteries: From Nanoscale Ionics to Interface-Integrated Architectures. [PDF]

Nanomicro Lett
Zheng M, Xu X, Wang X, Lin H, Hou C, Khan M, Zhu J, Han S.   +7 more
europepmc   +1 more source

Some of the next articles are maybe not open access.

Related searches:

Impact of self-sputtering in high power impulse magnetron sputtering (HiPIMS) with helium

Journal of Applied Physics, 2023
Conventional magnetron discharge is a widely used technology for many applications. In the last decade, the high current density sputtering regime has been an interesting alternative for tailoring thin film properties. In this paper, we focused on the electrical characterization of the helium magnetron plasma operated at average gas pressure (5 Pa ...
Erwan Morel, Yoann Rozier, Abderzak El Farsy, Tiberiu Minea   +3 more
openaire   +1 more source

Pattern Formation in High Power Impulse Magnetron Sputtering (HiPIMS) Plasmas

Plasma Chemistry and Plasma Processing, 2019
High power impulse magnetron sputtering (HiPIMS) plasmas produce a very energetic growth flux for the synthesis of thin films with superior properties. High power densities in the range of a few $$\hbox {kW}/\hbox {cm}^2$$ are applied to a metal target electrode in short pulses with a length of 10–$$400\,\upmu \hbox {s}$$ and duty cycles of a few ...
Julian Held, Achim von Keudell
openaire   +1 more source

E. coli Inactivation by High-Power Impulse Magnetron Sputtered (HIPIMS) Cu Surfaces

The Journal of Physical Chemistry C, 2011
This study reports HIPIMS-sputtered samples of Cu-particulate films with currents at 6 and 60 amps leading to E. coil inactivation. The Cu coverage and nanoparticle structure of the fibers is reported by TEM. Evidence is presented of redox processes in the Cu taking place during E.
Kusiak-Nejman, E., Morawski, A. W., Ehiasarian, A. P., Pulgarin, C., Baghriche, O., Mielczarski, E., Mielczarski, J., Kulik, A., Kiwi, J.   +8 more
openaire   +2 more sources

Application of High Power Impulse Magnetron Sputtering (HIPIMS) Technology for Deposition of Protective Coatings

2020 7th International Congress on Energy Fluxes and Radiation Effects (EFRE), 2020
The effects of using of the HIPIMS technology for deposition of coatings for various purposes, including CrB, TiAlNiC, and MoHfSiB, are studied. Ceramic targets obtained by self-propagating high-temperature synthesis were used for sputtering. It is shown that the transition from DC to HIPIMS modes increases the structure density, hardness, elastic ...
Philipp Kiryukhantsev-Korneev, Evgeny Levashov   +1 more
openaire   +1 more source

Parametric studyoflow frequency rotating structures in high power impulse magnetron sputtering (HIPIMS) discharges

2013 Abstracts IEEE International Conference on Plasma Science (ICOPS), 2013
Summary form only given. HiPIMS discharges are able to produce a high density plasma (peak electron density 1018 - 1020 m-3) by applying large voltages to a target. Electrons are effectively magnetized by a strong magnetic field (100 mT), and exhibit an E x B drift in the azimuthal direction in the plane of the target.
Sara Gallian, Thomas Mussenbrock, Ralf-Peter Brinkmann, William N. G. Hitchon   +3 more
openaire   +1 more source

Optical emission spectroscopy of High Power Impulse Magnetron Sputtering (HiPIMS) of CIGS thin films

2014 IEEE 40th Photovoltaic Specialist Conference (PVSC), 2014
CuIn 1−x Ga x Se 2 (CIGS) thin films with x = 0, 0.28 and 1 were prepared by the sputtering of Cu, In and Ga in HiPIMS (High Power Impulse Magnetron Sputtering) or DC magnetron and subsequently selenized in an Ar+Se atmosphere. Optical emission spectroscopy (OES) was used to monitor differences in HiPIMS and DC plasma during sputtering of metallic ...
Jiri Olejnicek, Zdenek Hubicka, Michal Kohout, Petra Ksirova, Michaela Brunclikova, Stepan Kment, Martin Cada, Scott A. Darveau, Christopher L. Exstrom   +8 more
openaire   +1 more source

Characterization and device applications of ZnO films deposited by high power impulse magnetron sputtering (HiPIMS)

Journal of Physics D: Applied Physics, 2013
ZnO films have been reactively deposited on sapphire substrates at 300 °C using a high impulse power magnetron sputtering deposition system and characterized structurally, optically and electronically. The unintentionally doped n-type ZnO films exhibit high transparency, moderate carrier concentration (∼5 × 1018 cm−3) and a Hall mobility of 8.0 cm2 V−1 
J G Partridge, E L H Mayes, N L McDougall, M M M Bilek, D G McCulloch   +4 more
openaire   +1 more source