Results 91 to 100 of about 191 (133)
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2013 Abstracts IEEE International Conference on Plasma Science (ICOPS), 2013
Summary form only given. HiPIMS discharges are able to produce a high density plasma (peak electron density 1018 - 1020 m-3) by applying large voltages to a target. Electrons are effectively magnetized by a strong magnetic field (100 mT), and exhibit an E x B drift in the azimuthal direction in the plane of the target.
Sara Gallian +3 more
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Summary form only given. HiPIMS discharges are able to produce a high density plasma (peak electron density 1018 - 1020 m-3) by applying large voltages to a target. Electrons are effectively magnetized by a strong magnetic field (100 mT), and exhibit an E x B drift in the azimuthal direction in the plane of the target.
Sara Gallian +3 more
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Optical emission spectroscopy of High Power Impulse Magnetron Sputtering (HiPIMS) of CIGS thin films
2014 IEEE 40th Photovoltaic Specialist Conference (PVSC), 2014CuIn 1−x Ga x Se 2 (CIGS) thin films with x = 0, 0.28 and 1 were prepared by the sputtering of Cu, In and Ga in HiPIMS (High Power Impulse Magnetron Sputtering) or DC magnetron and subsequently selenized in an Ar+Se atmosphere. Optical emission spectroscopy (OES) was used to monitor differences in HiPIMS and DC plasma during sputtering of metallic ...
Jiri Olejnicek +8 more
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Journal of Physics D: Applied Physics, 2013
ZnO films have been reactively deposited on sapphire substrates at 300 °C using a high impulse power magnetron sputtering deposition system and characterized structurally, optically and electronically. The unintentionally doped n-type ZnO films exhibit high transparency, moderate carrier concentration (∼5 × 1018 cm−3) and a Hall mobility of 8.0 cm2 V−1
J G Partridge +4 more
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ZnO films have been reactively deposited on sapphire substrates at 300 °C using a high impulse power magnetron sputtering deposition system and characterized structurally, optically and electronically. The unintentionally doped n-type ZnO films exhibit high transparency, moderate carrier concentration (∼5 × 1018 cm−3) and a Hall mobility of 8.0 cm2 V−1
J G Partridge +4 more
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IEEE Transactions on Plasma Science, 2010
Nanoscale multilayer TiAlCN/VCN coating has been deposited by pure unbalanced magnetron sputtering (UBM) and high-power impulse magnetron sputtering (HiPIMS)-UBM techniques. The V+ HiPIMS etching used in both processes has shown excellent adhesion (Lc > 50) of the coating to the substrate.
G. Kamath +2 more
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Nanoscale multilayer TiAlCN/VCN coating has been deposited by pure unbalanced magnetron sputtering (UBM) and high-power impulse magnetron sputtering (HiPIMS)-UBM techniques. The V+ HiPIMS etching used in both processes has shown excellent adhesion (Lc > 50) of the coating to the substrate.
G. Kamath +2 more
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Annual Technical Conference Proceedings, 2013
TiN coatings were deposited by conventional dc unbalanced magnetron (UBM) sputtering, combined High Power Impulse Magnetron Sputtering (HIPIMS)/UBM and pure HIPIMS sources in an industrial size 4 cathode magnetron sputtering machine with a bias of -50V during deposition.
A.A. Sugurmaran +5 more
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TiN coatings were deposited by conventional dc unbalanced magnetron (UBM) sputtering, combined High Power Impulse Magnetron Sputtering (HIPIMS)/UBM and pure HIPIMS sources in an industrial size 4 cathode magnetron sputtering machine with a bias of -50V during deposition.
A.A. Sugurmaran +5 more
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2016
We have studied the texture evolution of Aluminum nitride (AlN) thin. AlN thin films were deposited on Si (100) substrate by dc magnetron sputtering (dcMS) and High Power Impulse Magnetron Sputtering (HiPIMS) technics. The growth of AlN thin films is observed to occur in two phases, stable hexagonal phase (AlN_H) and cubic phase (AIN_C).
B. Riah +4 more
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We have studied the texture evolution of Aluminum nitride (AlN) thin. AlN thin films were deposited on Si (100) substrate by dc magnetron sputtering (dcMS) and High Power Impulse Magnetron Sputtering (HiPIMS) technics. The growth of AlN thin films is observed to occur in two phases, stable hexagonal phase (AlN_H) and cubic phase (AIN_C).
B. Riah +4 more
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Journal of Photochemistry and Photobiology A: Chemistry, 2012
This study addresses the high power impulse magnetron sputtering (HIPIMS) deposition of Ag-nanoparticle films on polyester and the comparison with films deposited by direct current pulsed magnetron sputtering (DCMSP). The first evidence is presented for the Escherichia coli bacterial inactivation by HIPIMS sputtered polyester compared to Ag-polyester ...
Baghriche, O. +6 more
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This study addresses the high power impulse magnetron sputtering (HIPIMS) deposition of Ag-nanoparticle films on polyester and the comparison with films deposited by direct current pulsed magnetron sputtering (DCMSP). The first evidence is presented for the Escherichia coli bacterial inactivation by HIPIMS sputtered polyester compared to Ag-polyester ...
Baghriche, O. +6 more
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Bi-polar High-Power Impulse Magnetron Sputtering (HiPIMS) Synthesis of High Entropy Carbides
2021Hossain, Mohammad Delower +2 more
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High Power Impulse Magnetron Sputtering – HIPIMS
2014R. Bandorf, V. Sittinger, G. Bräuer
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