Results 81 to 90 of about 191 (133)
APL MaterialsThe demand for efficient data processing motivates a shift toward in-memory computing architectures. Ferroelectric materials, particularly AlScN, show great promise for next-generation memory devices.
Federica Messi +5 more
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High power impulse magnetron sputtering (HIPIMS) : Fundamental plasma studies and material synthesis. [PDF]
Physical vapour deposition (PVD) technology is widely used for deposition of coatings with applications in various industries; coatings in semiconductor industry, optical coatings or hard coatings mostly used in car and aerospace industries. In 1999 novel physical vapour deposition technology entitled high power impulse magnetron sputtering (HIPIMS ...
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Transition Mode Control in Reactive High-Power Impulse Magnetron Sputtering (R-HiPIMS)
Journal of the Vacuum Society of Japan, 2017 Tetsuhide SHIMIZU +4 more
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Magnetic Field Dependent Characteristics of Al-doped ZnO by High Power Impulse Magnetron Sputtering (HIPIMS) [PDF]
Korean Journal of Materials Research, 2010 openaire +1 more source
, 2007 The emerging technology of High Power Impulse Magnetron Sputtering (HIPIMS) has much in common with the more established technology of Plasma Based Ion Implantation & Deposition (PBIID): both use pulsed plasmas, the pulsed sheath periodically evolves and collapses, the plasma-sheath system interacts with the pulse-driving power supply, the plasma ...
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Impact of self-sputtering in high power impulse magnetron sputtering (HiPIMS) with helium
Journal of Applied Physics, 2023Conventional magnetron discharge is a widely used technology for many applications. In the last decade, the high current density sputtering regime has been an interesting alternative for tailoring thin film properties. In this paper, we focused on the electrical characterization of the helium magnetron plasma operated at average gas pressure (5 Pa ...
Erwan Morel +3 more
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Pattern Formation in High Power Impulse Magnetron Sputtering (HiPIMS) Plasmas
Plasma Chemistry and Plasma Processing, 2019High power impulse magnetron sputtering (HiPIMS) plasmas produce a very energetic growth flux for the synthesis of thin films with superior properties. High power densities in the range of a few $$\hbox {kW}/\hbox {cm}^2$$ are applied to a metal target electrode in short pulses with a length of 10–$$400\,\upmu \hbox {s}$$ and duty cycles of a few ...
Julian Held, Achim von Keudell
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E. coli Inactivation by High-Power Impulse Magnetron Sputtered (HIPIMS) Cu Surfaces
The Journal of Physical Chemistry C, 2011This study reports HIPIMS-sputtered samples of Cu-particulate films with currents at 6 and 60 amps leading to E. coil inactivation. The Cu coverage and nanoparticle structure of the fibers is reported by TEM. Evidence is presented of redox processes in the Cu taking place during E.
Kusiak-Nejman, E. +8 more
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2020 7th International Congress on Energy Fluxes and Radiation Effects (EFRE), 2020
The effects of using of the HIPIMS technology for deposition of coatings for various purposes, including CrB, TiAlNiC, and MoHfSiB, are studied. Ceramic targets obtained by self-propagating high-temperature synthesis were used for sputtering. It is shown that the transition from DC to HIPIMS modes increases the structure density, hardness, elastic ...
Philipp Kiryukhantsev-Korneev +1 more
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The effects of using of the HIPIMS technology for deposition of coatings for various purposes, including CrB, TiAlNiC, and MoHfSiB, are studied. Ceramic targets obtained by self-propagating high-temperature synthesis were used for sputtering. It is shown that the transition from DC to HIPIMS modes increases the structure density, hardness, elastic ...
Philipp Kiryukhantsev-Korneev +1 more
openaire +1 more source