Results 131 to 140 of about 168 (150)
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Laser and e-beam mask-to-silicon with inverse lithography technology (ILT)
SPIE Proceedings, 2005This paper presents ILT masks written by a DUV laser writer and a VSB e-beam writer, and their corresponding wafer print results. ILT mathematically determine the mask features that produce the desired on-wafer results. ILT-generated masks sometimes are non-intuitive, and different than those produced by past approaches; therefore, their ...
Linyong Pang +3 more
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Enhancing DRAM printing process window by using inverse lithography technology (ILT)
SPIE Proceedings, 2006Inverse lithography technology (ILT) was studied during process development for four layers from memory semiconductor designs. This paper describes techniques used in each of the layers. So as to demonstrate this technology in a wide range of semiconductor patterns, we show results from all four layers.
Chih-Wei Chu +8 more
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Considering MEEF in inverse lithography technology (ILT) and source mask optimization (SMO)
SPIE Proceedings, 2008Mask Error Enhancement Factor (MEEF) plays an increasingly important role in the DFM and RET flow required to continue shrinking designs in the low-k1 lithography regime. The ability to model and minimize MEEF during lithography optimization and RET application is essential to obtain a usable process window (PW).
Linyong Pang +7 more
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MTO-like reference mask modeling for advanced inverse lithography technology patterns
SPIE Proceedings, 2017Advanced Inverse Lithography Technology (ILT) can result in mask post-OPC databases with very small address units, all-angle figures, and very high vertex counts. This creates mask inspection issues for existing mask inspection database rendering. These issues include: large data volumes, low transfer rate, long data preparation times, slow inspection ...
Jongju Park +12 more
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Deep Learning-Driven Inverse Lithography Technology for Dmd-Based Maskless Projection Lithography
2023Jing-Tao Chen +3 more
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An Approach to Extracting SRAF Rules from Inverse Lithography Technology Results
2023 International Workshop on Advanced Patterning Solutions (IWAPS), 2023Yao Jin +10 more
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Application of source mask optimization in inverse lithography technology for multiple patterns
Proceedings of SPIE, 2009Hyo-chan Kim +8 more
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Level-set-based inverse lithography for photomask synthesis
Optics Express, 2009Lam Eym, Yijiang Shen
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